Copper foil as well as preparation method and application thereof
A technology of copper foil and rough surface, applied in the field of electronic materials, can solve problems such as difficult to meet peel strength and signal loss at the same time, achieve the effect of improving peel strength, avoiding short circuit phenomenon, and reducing burrs
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[0030] The second aspect of the invention provides a method of preparing a copper foil product, wherein the method comprises the following steps:
[0031] (1) The first surface treatment was performed in the primary treatment liquid to obtain a copper foil at a time treatment liquid, and the primary treatment liquid comprising copper ions 2-. of the total amount of the primary treatment liquid. 40g / L, 50-300 g / L of sulfuric acid, bismuth sulfate 30-400 ppm, sodium tungstate 5-250 ppm, rare earth salt 20-400 ppm;
[0032] (2) The primary treatment copper foil is subjected to a second surface treatment in the secondary treatment solution to obtain a copper foil product; wherein the secondary processing liquid is obtained based on the total amount of the secondary treatment liquid. Copper ions 20-80 g / l, 50-200 g / l, chloride ions 50-400 ppm.
[0033] In step (1),
[0034] In a preferred embodiment, the raw material copper foil has a thickness of from 12 to 70 μm, preferably f...
Example Embodiment
[0056] Example 1
[0057] (1) The copper foil having a thickness of 18 μm is placed in a primary treatment liquid for the first surface treatment to obtain a copper foil at a time; wherein the copper ion is provided by copper sulfate, copper ions in one treatment liquid. The concentration of 10 g / L, the concentration of sulfuric acid was 100 g / L, the concentration of sulfate was 100 ppm, the concentration of sodium tungstate was 50 ppm, and the concentration of sulfate was 100 ppm; the first surface treatment conditions included: first time Surface treatment limit current density is 25A / DM 2 The treatment temperature of the first surface treatment is 20 ° C, and the processing time of the first surface treatment is 3 s;
[0058] (2) The above-described primary treatment copper foil is subjected to a second surface treatment in the secondary treatment liquid to obtain a copper foil product having a rice granulated tumor point surface; wherein the copper ions in the secondary ...
Example Embodiment
[0059] Example 2
[0060] (1) The copper foil having a thickness of 18 μm is placed in a primary treatment liquid for the first surface treatment to obtain a copper foil at a time; wherein the copper ion is provided by copper sulfate, copper ions in one treatment liquid. The concentration of 15 g / L, the concentration of sulfuric acid was 120 g / L, the concentration of sulfate was 150 ppm, the concentration of sodium tungstate was 20 ppm, and the concentration of the lastium sulfate was 150 ppm; the first surface treatment conditions included: first time Surface treatment limit current density is 20A / DM 2 The processing temperature of the first surface treatment is 15 ° C, the treatment time of the first surface treatment is 2s;
[0061] (2) The above-described primary treatment copper foil is subjected to a second surface treatment in the secondary treatment liquid to obtain a copper foil product having a rice granulated tumor point surface; wherein the copper ions in the sec...
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