Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A high acid-resistant medium slurry

A medium slurry, acidic medium technology, applied in the direction of cellulosic material, inorganic insulators, organic insulators, etc., to achieve the effect of improving structure, strong adjustability, and eliminating internal stress

Active Publication Date: 2021-12-21
西安宏星电子浆料科技股份有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The acid resistance of the dielectric slurry determines its promotion speed. There are two reasons: First, the cost problem: the dielectric slurry is used in various electronic devices such as resistors and filters, and most of the substrate area needs to be covered with the dielectric slurry. to achieve insulation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A high acid-resistant medium slurry
  • A high acid-resistant medium slurry
  • A high acid-resistant medium slurry

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Preparation of glass powder: Precisely mix 1 kg of bismuth oxide 60%, silicon oxide 25%, aluminum oxide 5%, boric acid 6%, and zinc oxide 4% in a polytetrafluoroethylene tank according to the mass percentage, and then seal the polytetrafluoroethylene The ethylene tank was placed on an eight-roller ball mill for 1.5 hours of mixing; after the mixing was completed, the resulting mixture was put into a 2L quartz crucible, and placed in a 1200°C resistance furnace for heat preservation and melting for 1.5 hours, and the obtained glass solution was water-quenched to obtain glass slag. Put the glass slag into a 3L zirconia ball mill jar, add pure water according to the mass ratio of material to water at 1:1, put it on an eight-roller ball mill and grind it until the particle size D50≤1.5μm, pour it out, and use a 600-mesh screen After sieving, put the sifted liquid into an oven and dry at 120°C for 24 hours to obtain Bi-Si-B glass powder; refill the Bi-Si-B glass powder into a...

Embodiment 2

[0025] Preparation of glass powder: Precisely mix 1 kg of bismuth oxide 55%, silicon oxide 30%, aluminum oxide 4%, boric acid 9%, and zinc oxide 2% in a polytetrafluoroethylene tank according to the mass percentage, and then seal the polytetrafluoroethylene Put the ethylene tank on an eight-roller ball mill for mixing for 1.5 hours; after the mixing is completed, the resulting mixture is put into a 2L quartz crucible, and placed in a resistance furnace at 1100°C for 1 hour of heat preservation and melting. The obtained glass solution is water-quenched to obtain a glass body. The glass body is broken into glass slag, and the glass slag is put into a 3L zirconia ball mill jar, and pure water is added according to the mass ratio of material to water of 1:1, and placed on an eight-roller ball mill until the particle size D50≤1.5μm, then poured out, and used Sieve through a 600-mesh sieve, put the sieved liquid into an oven and dry at 120°C for 24 hours to obtain Bi-Si-B glass powde...

Embodiment 3

[0029] Preparation of glass powder: Precisely mix 1 kg of bismuth oxide 75%, silicon oxide 20%, aluminum oxide 2%, boric acid 2%, and zinc oxide 1% in a polytetrafluoroethylene tank according to the mass percentage, and then seal the polytetrafluoroethylene Put the ethylene tank on an eight-roller ball mill for mixing for 2 hours; after the mixing is completed, the resulting mixture is put into a 2L quartz crucible, and placed in a 1300°C resistance furnace for heat preservation and melting for 1 hour, and the obtained glass solution is water-quenched to obtain a glass body. The glass body is broken into glass slag, and the glass slag is put into a 3L zirconia ball mill jar, and pure water is added according to the mass ratio of material to water of 1:1, and placed on an eight-roller ball mill until the particle size D50≤1.5μm, then poured out, and used Sieve through a 600-mesh sieve, put the sieved liquid into an oven and dry at 120°C for 24 hours to obtain Bi-Si-B glass powde...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a medium slurry with high acid resistance. The glass powder used in the medium slurry is obtained by tempering Bi-Si-B series glass powder at 500-600 DEG C for 20-24 hours; , β-cellulose, etc. to prepare organic carriers; chromium trioxide, cadmium trioxide, titanium dioxide, etc. are added as oxide additives to further enhance the stability of the slurry. The binder phase glass powder used in the medium slurry of the invention adds high temperature tempering on the basis of the traditional water quenching process, which can eliminate the internal stress generated in the process of smelting and ball milling, and further improve the compactness; at the same time, it is used in the preparation process of the organic carrier. Butyraldehyde oxime replaces terpineol, the prepared slurry not only has extremely high acid resistance, but also can ensure stable breakdown voltage and low encapsulation change rate, which can adapt to harsher use environments and prolong its use. It has obvious economic benefits at the same time of life.

Description

technical field [0001] The invention belongs to the technical field of medium slurry, and in particular relates to a medium slurry with high acid resistance. Background technique [0002] For a long time, the acid resistance of the dielectric paste has determined the service life of the substrate after printing and the limitations of the use environment. The existing dielectric paste on the market will be soaked in 5% dilute sulfuric acid after printing, and the surface layer will appear to varying degrees. Shedding phenomenon, lower service life and greater uncertainty. The acid resistance of the dielectric slurry determines its promotion speed. There are two reasons: First, the cost problem: the dielectric slurry is used in various electronic devices such as resistors and filters, and most of the substrate area needs to be covered with the dielectric slurry. In order to achieve the insulation effect. It is urgent to find a kind of dielectric slurry, which can greatly imp...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01B3/08H01B3/18C03C12/00
CPCH01B3/087H01B3/085H01B3/185H01B3/18C03C12/00
Inventor 周碧赵科良张豪刘姚王要东雷莉君边甄勇艾志远
Owner 西安宏星电子浆料科技股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products