Low-power-consumption transverse power device with anode groove
A technology of lateral power devices and anode slots, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of reducing the reliability of devices in parallel use, and achieve the suppression of snapback phenomenon, increase the hole injection area, and low conduction voltage drop Effect
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Embodiment 1
[0021] like figure 1 As shown in the figure, the low-power LIGBT with anode groove in this example includes a P substrate 1, a buried oxide layer 2, a top semiconductor layer and a field oxide layer 72 that are stacked in sequence from bottom to top; the top semiconductor layer Along the lateral direction of the device, it includes a cathode structure, a gate structure, an N drift region 3, an anode structure and an anode cell structure;
[0022] The cathode structure is located at one end of the upper layer of the N drift region 3, including a P well region 4, a P+ body contact region 5, an N+ cathode region 6 and a conductive material 81; the P well region 4 is located at one end of the upper layer of the N drift region 3, and the P+ The body contact region 5 and the N+ cathode region 6 are in contact with each other and are located at one end of the inner upper surface of the P well region 4 away from the N drift region 3, and the N+ cathode region 6 is on the side close to...
Embodiment 2
[0030] like figure 2 As shown, this example and Example 1 figure 1 The difference is that the dielectric groove 73 of the anode groove structure includes the P-type polysilicon region 16, and the sidewall and lower surface of the P-type polysilicon region 16 are surrounded by the dielectric groove 73. It is easier to achieve a smooth surface than silicon dioxide, and the P-type polysilicon region in the new device of this example is easier to achieve a smooth upper surface in the process.
Embodiment 3
[0032] like image 3 As shown, this example and the one in Example 1 figure 1 or in Example 2 figure 2 The difference is that the doping type and concentration of the N-type doped region 13 of the anode trench structure are the same as those of the N-drift region 3. Compared with Example 1 or Example 2, the N-type doped region 13 in the new device of this example is the same. Since the doping concentration is the same as that of the N drift region 3, it is easier to implement in the process.
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