Method for making composite substrate of microstrip gas-compartment detector
A technology of a composite substrate and a manufacturing method, which is applied in the field of manufacturing a composite substrate of a micro-strip gas chamber detector, can solve the problems of reducing multi-level scattering, difficulty in obtaining S8900 glass, etc., and achieves improved stability, excellent physical and chemical stability, The effect of improving the signal-to-noise ratio
Inactive Publication Date: 2006-06-14
SHANGHAI UNIV
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Problems solved by technology
People have found a very stable glass substrate called Schott S8900, which is an electronically conductive semiconductor glass with suitable resistivity, but in order to reduce multi-level scattering, the thickness of the substrate should not be greater than a few hundred μm, but it is difficult to obtain such Thin S8900 Glass
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Embodiment 1
[0024] Use optical glass D263 with a thickness of 0.5mm and an area of 2cm×2cm as the substrate, and ultrasonically clean it in acetone and deionized water for 10 minutes in sequence. After drying, the substrate was placed into a radio frequency plasma-assisted chemical vapor deposition device (such as figure 1 ) on the cathode graphite target 7 in the vacuum reaction chamber 9, the radio frequency frequency is 13.56 MHz, and high-purity (99.99%) methane gas and high-purity (99.998%) argon gas are used as reactants. The flow of the two gases is controlled by their respective flow meters and mixed before entering the reaction chamber. The flow rate of the argon branch is controlled at 60ml / min, and the flow rate of methane is 30ml / min. A vacuum pump+molecular pump air extraction system 15 and a pressure reducing valve 14 are connected below the reaction chamber 9, which can carry out high vacuum and decompression, and maintain the stability of the air pressure in the reaction...
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Abstract
The invention relates to a method for manufacturing a composite substrate of a microstrip gas chamber detector, which is prepared by depositing a diamond-like film on D263 glass by adopting a radio frequency plasma-assisted chemical vapor deposition method. The optical glass D263 is pretreated, deposited in a high-vacuum reaction chamber, and then annealed in a nitrogen atmosphere furnace to obtain a composite substrate. The invention obtains a high-quality diamond-like film / D263 glass composite substrate by applying bias voltage, increasing magnetic field and annealing treatment, which can overcome the problems of high stress and poor bonding force between the film and the substrate, and make the detector charge accumulation effect small and the substrate stable Good sex. The invention has the advantages of simple manufacturing process, fast manufacturing cycle, low cost and strong practicability.
Description
technical field [0001] The invention relates to a method for manufacturing a microstrip gas chamber (MSGC) detector compound substrate, which is made by depositing a diamond-like carbon (DLC) film on D263 glass. It belongs to the field of thin film vapor deposition technology, detectors, high energy physics and nuclear physics. Background technique [0002] In 1988, A.Oed proposed a new type of position sensitive detector - Microstrip Gas Chamber (MSGC) based on the multi-wire proportional chamber. Due to the small electrode strip width and spacing, and good uniformity, the positive The ion collection time is very short, which can meet the requirements of working at a high count rate, and shows the advantages of high spatial resolution and time resolution. Candidates for track detectors, and are being developed for X-ray imaging detectors. Although the microstrip gas chamber has shown excellent performance, some problems have been found in the research, mainly the positive...
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IPC IPC(8): C03C17/22
Inventor 夏义本王林军张明龙杨莹汪琳
Owner SHANGHAI UNIV