Copper alloy foil for laminated board
A copper alloy foil and laminated board technology, applied in the improvement of metal adhesion of insulating substrates, layered products, metal layered products, etc., can solve the problem of poor wettability, unstable varnish adhesion, difficult polyimide film thickness Uniformity and other issues to achieve the effect of high conductivity and strength
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Embodiment 1
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[0042] Table 2
[0043]On the other hand, No. 15 of the comparative example shown in Table 1 is the rolled copper foil to which the alloy component of this invention was added. An ingot made by melting and casting oxygen-free copper in an Ar atmosphere is processed into a foil, which is bonded with polyimide. Since the raw material is pure copper, it has good electrical conductivity, but the 180°peel strength is 7.5N / cm, which does not reach a sufficiently high adhesive strength. Therefore, peeling may occur after it is made into a printed circuit board.
[0044] No. 16 and No. 17 of the comparative example were processed into foils in the same manner as in the examples after adding only one selected from Cr and Zr. Because the concentration of Cr and Zr is less than 0.01% by weight, therefore, the effect of improving the strength is not satisfactory, and the tensile strength is low, less than 600N / mm 2 .
[0045] In Comparative Example No....
Embodiment 2
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[0051] Table 4
[0052] On the other hand, No. 33 of the comparative example shown in Table 3 is the rolled copper foil which added the alloy component of this invention. An ingot made by melting and casting oxygen-free copper in an Ar atmosphere is processed into a foil, which is bonded with polyimide. Since the raw material is pure copper, it has good electrical conductivity, but the 180°peel strength is 7.5N / cm, which does not reach a sufficiently high adhesive strength. Therefore, peeling may occur after it is made into a printed circuit board. In addition, due to the low tensile strength, less than 650N / mm 2 , so manual handling is poor.
[0053] No. 34 and No. 35 of the comparative example were processed into foils by the same method as the examples after adding Ni and Si. As No.34, since the concentration of Si is less than 0.2% by mass, the tensile strength is low, less than 650N / mm 2 , The electrical conductivity is also ...
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Abstract
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