Process for preparing high polymer micro-flow control chips

A microfluidic chip and polymer technology, applied in biochemical equipment and methods, microbial determination/inspection, biological testing, etc., can solve problems such as being unsuitable for mass production, increasing production costs, and easily falling off photoresist , to achieve the effect of hard material, easy mass production and low price

Inactive Publication Date: 2003-12-31
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is very simple to make a chip, but the photoresist on the negative plate is easy to fall off, which is not suitable for mass production, and this method needs to consume a lot of photoresist, which will increase the production cost
[0014] The inventor o

Method used

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  • Process for preparing high polymer micro-flow control chips
  • Process for preparing high polymer micro-flow control chips

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0048] Example 1:

[0049] (1) Fabrication of cover sheet: A stainless steel column with a diameter of 2mm and a height of 2mm is placed on a specific position of the smooth glass, and the mixture of PMMA monomer and benzoyl peroxide (weight ratio is 1000: 5) is pre-processed. After polymerization and degassing, it was transferred to the glass, the air was removed and sealed, and after 24 hours of low temperature polymerization (45°C) and two hours of high temperature polymerization (90°C), the release template was taken out at 40°C. (2) Metal negative plate production: the titanium gold plate is rinsed with water, placed in the lotion for one day, to remove the surface oil, rinse with distilled water, and dry. Spin glue (BP-213) on the titanium gold plate and pre-bake, the pre-bake time is 5 minutes, the temperature is 90 degrees. Place the mask with the microchannel network on the photoresist, expose to UV light for 1 minute, and then use 0.5wt% NaOH solution to develop at 15°C ...

Example Embodiment

[0052] Example 2:

[0053] (1) Metal negative plate production: the stainless steel plate is rinsed with water, placed in the lotion for one day, to remove the surface oil, rinse with distilled water, and dry. Spin glue (RZJ-390) on the stainless steel plate and pre-bake, the pre-bake time is 1.5 minutes, and the temperature is 100 degrees. Place the mask with the microchannel network pattern on the photoresist, expose to ultraviolet light for 20 seconds, then put the metal plate in 0.4wt% NaOH solution, develop at 25°C for 5 minutes, and remove the microchannels from the stainless steel plate. The photoresist outside the channel network is heat-baked at 130 degrees for half an hour. The stainless steel plate is etched with an acidic ferric chloride solution at 50°C for 10 minutes. The ferric chloride content in the etching solution is 25wt%, and the etching solution contains 0.2wt% quaternary ammonium salt corrosion inhibitor. Thus, a stainless steel negative plate with a convex ...

Example Embodiment

[0056] (4) Close the cover sheet of step (3) and the base sheet of step (1), and heat at 120 degrees for 10 minutes to bond. A PMMA chip with a channel width of 100 microns and a channel depth of 20 microns is obtained. Example 3:

[0057] (1) Metal negative plate production: the stainless steel plate is rinsed with water, placed in the lotion for one day, to remove the surface oil, rinse with distilled water, and dry. Adopt the screen printing technology to apply glue JL-SR1000 on the stainless steel plate and pre-bake, the pre-bake time is 30 minutes, and the temperature is 80 degrees. Place the mask plate with the microchannel network pattern on the photoresist, expose to ultraviolet light for 20 seconds, and then put the metal plate in 0.2wt% Na 2 CO 3 In the solution, develop at 25°C for 5 minutes, remove the photoresist outside the microchannel network on the stainless steel plate, and heat-bake at 120°C for 15 minutes. The stainless steel plate is etched with an acidic ferr...

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Abstract

The present invention relates to the making process of microflow controlling polymer chip, and is especially the metal plate printing process of making microflow controlling polymer chip. The microflow controlling polymer chip is used for separating microflow of nucleic acid of different sized DNA segments, amino acid, protein, organic pollutant molecule, metal ion, inorganic anion, etc. Photoresist is painted to metal plate and metal negative is produced through exposure, development and etching. The metal negative is used in making microflow controlling polymer chip. Compared with available method, the present invention uses negative with the advantages of low cost, simple production process, high repeatability, hard material and long service life.

Description

technical field [0001] The present invention relates to a method for manufacturing a polymer microfluidic chip, in particular to a method for preparing a polymer microfluidic chip printed on a metal template, specifically, it is suitable for DNA fragments of various sizes in a small amount. A method for manufacturing a microfluidic chip for the separation of organic molecules such as nucleic acids, amino acids, proteins, and organic pollutants, metal ions, and inorganic anions. Background technique [0002] The development of science and technology requires analytical science to provide information on substances to be tested more quickly with lower energy consumption and simpler methods. The most representative research is the micro-total analysis system using semiconductor micro-processing technology. That is, a microchannel with a width of about 20-200 microns and a depth of about 10-50 microns is produced on a glass or quartz sheet by photoetching tec...

Claims

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Application Information

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IPC IPC(8): C12Q1/68G01N21/01G01N21/03G01N33/00G01N33/50G01N33/543G01N33/68
Inventor 高云华陈志锋林金明施盟泉吴飞鹏
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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