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Process for preparing high polymer micro-flow control chips

A microfluidic chip and polymer technology, applied in biochemical equipment and methods, microbial determination/inspection, biological testing, etc., can solve problems such as being unsuitable for mass production, increasing production costs, and easily falling off photoresist , to achieve the effect of hard material, easy mass production and low price

Inactive Publication Date: 2003-12-31
TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method is very simple to make a chip, but the photoresist on the negative plate is easy to fall off, which is not suitable for mass production, and this method needs to consume a lot of photoresist, which will increase the production cost
[0014] The inventor of this patent application once tried to directly polymerize PMMA on-line on the silicon negative film, but when the PMMA was cooled and removed after polymerization, the silicon negative film was easily broken due to uneven force, and the operation was troublesome

Method used

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  • Process for preparing high polymer micro-flow control chips
  • Process for preparing high polymer micro-flow control chips

Examples

Experimental program
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Effect test

Embodiment 1

[0049] (1) Production of cover slip: Place a stainless steel column with a diameter of 2 mm and a height of 2 mm on a specific position of the smooth glass, and the mixture of PMMA monomer and benzoyl peroxide (1000:5 by weight) is pre-treated. After polymerization and degassing, it was transferred to the glass, and the air was removed and sealed. After 24 hours of low-temperature polymerization (45° C.) and two hours of high-temperature polymerization (90° C.), the peeling template was taken out at 40° C. (2) Metal negative plate production: Rinse the titanium gold plate with water, put it in a lotion for one day, remove the surface oil, rinse it with distilled water, and dry it. Spin the glue (BP-213) on the titanium plate and pre-bake it. The pre-bake time is 5 minutes and the temperature is 90 degrees. Place the mask plate with the microchannel network on the photoresist, expose it to ultraviolet light for 1 minute, and then use 0.5wt% NaOH solution to develop it at 15°C f...

Embodiment 2

[0053] (1) Production of metal negative plate: Rinse the stainless steel plate with water, put it in a lotion for one day, remove the surface oil, rinse it with distilled water, and dry it. Spin the glue (RZJ-390) on a stainless steel plate and pre-bake it. The pre-bake time is 1.5 minutes and the temperature is 100 degrees. Put the mask plate with the microchannel network pattern on the photoresist, expose it to ultraviolet light for 20 seconds, then put the metal plate in 0.4wt% NaOH solution, develop it at 25°C for 5 minutes, and remove the microchannels on the stainless steel plate. The photoresist outside the channel network is baked at 130 degrees for half an hour. The stainless steel plate was etched at 50° C. for 10 minutes with ferric chloride acidic corrosion solution, the content of ferric chloride in the corrosion solution was 25 wt %, and the corrosion solution contained 0.2 wt % of quaternary ammonium salt corrosion inhibitor. A stainless steel negative plate wi...

Embodiment 3

[0057] (1) Production of metal negative plate: Rinse the stainless steel plate with water, put it in a lotion for one day, remove the surface oil, rinse it with distilled water, and dry it. Apply glue JL-SR1000 on the stainless steel plate by screen printing technology and pre-baking. The pre-baking time is 30 minutes and the temperature is 80 degrees. Place the mask plate with the microchannel network pattern on the photoresist, expose to UV light for 20 seconds, and then put the metal plate into 0.2wt% Na 2 CO 3 In the solution, develop at 25°C for 5 minutes, remove the photoresist outside the microchannel network on the stainless steel plate, and bake at 120°C for 15 minutes. The stainless steel plate was etched at 50° C. for 10 minutes with ferric chloride acidic corrosion solution, the content of ferric chloride in the corrosion solution was 25 wt %, and the corrosion solution contained 0.2 wt % of quaternary ammonium salt corrosion inhibitor. A stainless steel negative...

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Abstract

The present invention relates to the making process of microflow controlling polymer chip, and is especially the metal plate printing process of making microflow controlling polymer chip. The microflow controlling polymer chip is used for separating microflow of nucleic acid of different sized DNA segments, amino acid, protein, organic pollutant molecule, metal ion, inorganic anion, etc. Photoresist is painted to metal plate and metal negative is produced through exposure, development and etching. The metal negative is used in making microflow controlling polymer chip. Compared with available method, the present invention uses negative with the advantages of low cost, simple production process, high repeatability, hard material and long service life.

Description

technical field [0001] The present invention relates to a method for manufacturing a polymer microfluidic chip, in particular to a method for preparing a polymer microfluidic chip printed on a metal template, specifically, it is suitable for DNA fragments of various sizes in a small amount. A method for manufacturing a microfluidic chip for the separation of organic molecules such as nucleic acids, amino acids, proteins, and organic pollutants, metal ions, and inorganic anions. Background technique [0002] The development of science and technology requires analytical science to provide information on substances to be tested more quickly with lower energy consumption and simpler methods. The most representative research is the micro-total analysis system using semiconductor micro-processing technology. That is, a microchannel with a width of about 20-200 microns and a depth of about 10-50 microns is produced on a glass or quartz sheet by photoetching tec...

Claims

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Application Information

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IPC IPC(8): C12Q1/68G01N21/01G01N21/03G01N33/00G01N33/50G01N33/543G01N33/68
Inventor 高云华陈志锋林金明施盟泉吴飞鹏
Owner TECHNICAL INST OF PHYSICS & CHEMISTRY - CHINESE ACAD OF SCI
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