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Magnesium vapour-deposition material

An evaporation material, magnesium oxide technology, applied in the direction of vacuum evaporation coating, metal material coating process, sputtering coating, etc., to achieve the effect of low hygroscopicity and high secondary electron emission efficiency

Inactive Publication Date: 2005-04-27
UBE CHEM IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, basic magnesium carbonate pentahydrate and iron oxide are mixed in a certain proportion, put into a mold, pressurized and formed, then calcined in the atmosphere to form particles, and the particles crushed into small pieces are used for evaporation materials, and evaporated by electron beam The plating method, in Patent Document 1, describes the formation of a magnesium oxide protective film in which iron oxide is solid-dissolved, but does not mention the iron oxide concentration in the particles (small pieces)

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-1

[0080] 50 parts by mass of magnesium oxide (MgO) powder (purity: 99.985% by mass, average particle diameter of primary particles: 0.2 μm, shape of primary particles: cube) and zirconia (ZrO 2 ) powder (purity: 99.9% by mass, average primary particle diameter: 0.2 μm) mixed powder [MgO / ZrO 2 =99.967 / 0.033 (molar ratio)] mixed and dispersed in 50 parts by mass of an aqueous solution having a polyethylene glycol concentration of 6 mass % and a polycarboxylate ammonium salt concentration of 1 mass % to prepare a slurry (temperature: 25° C.). After preparation, keep the temperature of the slurry at 25°C, and quickly (within about 15 minutes after the preparation of the slurry) use a spray dryer to spray the dry slurry (heating temperature: 230°C) to obtain a granulated material. The obtained granulated material was molded at a pressure of 2 tons / cm 2 Next, shaped into pellets (diameter: 6.0mm, height: 2.5mm, density of molded body: 2.50g / cm 3 ). Next, this molded product was cal...

Embodiment 1-2

[0089] In addition to making the composition ratio of the mixed powder MgO / ZrO 2 =99.84 / 0.16 (molar ratio), the others were prepared under the same conditions as in Example 1-1 to prepare sintered compact particles. The relative density of the obtained sintered body particles was 99.0%.

[0090] Using the sintered particles as a vapor deposition material, a magnesium oxide film was formed by electron beam vapor deposition in the same manner as in Example 1-1. Table 1 shows the zirconium content, secondary electron emission coefficient, and refractive index of the obtained magnesium oxide film.

Embodiment 1-3

[0092] In addition to making the composition ratio of the mixed powder MgO / ZrO 2 =99.67 / 0.33 (molar ratio), the others were prepared under the same conditions as in Example 1-1 to prepare sintered compact particles. The relative density of the obtained sintered body particles was 99.0%.

[0093] Using the sintered particles as a vapor deposition material, a magnesium oxide film was formed by electron beam vapor deposition in the same manner as in Example 1-1. Table 1 shows the zirconium content, secondary electron emission coefficient, and refractive index of the obtained magnesium oxide film.

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Abstract

This invention provides a magnesium oxide vapor-deposition material advantageously usable for forming a magnesium oxide film useful as a protective film for the dielectric layer of an alternating current type plasma display panel by an electron beam vapor-deposition method. The magnesium oxide vapor-deposition material comprises metal oxide in which the valence of the metallic element(s) is any of 3, 4 and 5 in the range of 0.01 to 6 mol%. Alternatively, the magnesium oxide vapor-deposition material comprises alkaline-earth metal oxide other than magnesium oxide, and metal oxide in which the valence of the metallic element(s) is any of 3, 4 and 5 in such a manner that each content is controlled to >=0.005 mol% expressed in terms of the metallic element contents, and also, the total content is controlled to <=6 mol% expressed in terms of the metallic element contents.

Description

technical field [0001] The present invention relates to a deposition material for forming a magnesium oxide film useful as a protective film for a dielectric layer of an AC plasma display panel. Background technique [0002] In an alternating current plasma display panel (AC type PDP), in order to prevent the dielectric layer on the electrode surface from being impacted (sputtered) by ions generated by plasma, a protective film is usually provided on the surface of the dielectric layer. A magnesium oxide film is widely used as a protective film for the dielectric layer. In forming the magnesium oxide film, an electron beam evaporation method is widely used, which is a method of evaporating an evaporation material by irradiation with an electron beam and depositing an evaporation material on a substrate. As the deposition material, single crystal magnesia (electroformed magnesia) or sintered body of magnesia obtained by sintering magnesia powder (polycrystalline magnesia) wa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J17/49B22F3/10C04B35/053C23C14/08C23C14/24H01J11/02
CPCC04B35/04C04B2235/3206C23C14/081H01J11/10H01J11/40
Inventor 植木明增田彰加藤裕三
Owner UBE CHEM IND CO LTD
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