Method for preparing Nano cerium oxdie, and application in chemical mechanical polishing chip of gallium arsenide

A technology of nano-cerium oxide and cerium nitrate, applied in chemical instruments and methods, polishing compositions containing abrasives, inorganic chemistry, etc., to achieve uniform distribution, low surface roughness, small surface and subsurface damage
CN1760132AInactive Publication Date: 2006-04-19JIANGSU POLYTECHNIC UNIVERSITY
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
JIANGSU POLYTECHNIC UNIVERSITY
Publication Date
2006-04-19
Estimated Expiration
Not applicable · inactive patent

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Abstract

A process for preparing cerium oxide nanoparticles includes such steps as proportionally dissolving cerium nitrate and hexamethylenetetraamine (HMT) respectively in alcohol and distilled water, mixing, stirring, sealing, heating at 70-90 deg.C for 1-2 hr, cooling, ageing for 1-2 hr, filter, washing deposit, and drying at 60-80 deg.C for 6-10 hr. The obtained CeO2 nanoparticles can be used to prepare the polishing liquid for polishing the semiconductor wafer of gallium arsenide.
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Description

technical field

[0001] The invention relates to the field of ultrafine powder preparation and its application, in particular to a preparation method of nano cerium oxide and its use in chemical mechanical polishing of gallium arsenide wafers. Background technique

[0002] Rare earth oxide CeO 2 It is a cheap and versatile material, widely used in luminescent materials, electronic ceramics, radiation-resistant glass, polishing powder, ultraviolet absorbing materials, fuel cells, automotive exhaust purification catalytic materials, etc., and has great development in modern high-tech fields Potential, many of these applications are based on powder, and the development of high technology has a great impact on CeO 2 The requirements are getting higher and higher, so nano-CeO 2 The preparation of powders has become one of the hotspots in research all over the world. At the same time, GaAs is an important substrate material for ultra-large-scale integrated circuits. Due to its h...

Claims

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