Article with organic/inorganic composite film and process for producing the same
An inorganic composite film and manufacturing method technology, applied in the direction of layered products, etc., can solve the problem of difficult formation of mechanical strength silica film, etc., and achieve the effect of superior mechanical strength and superior wear resistance
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Embodiment A1
[0077] In Example A1, a polyether phosphate ester-based surfactant was added to the coating solution (forming solution). Polyether phosphate ester surfactant is also a source of phosphorus supply.
[0078] In 23.7 g of ethanol (manufactured by Katayama Chemical), 45.14 g of tetraethoxysilane (manufactured by Shin-Etsu Chemical), 27.16 g of pure water, concentrated hydrochloric acid (35% by mass, manufactured by Kanto Chemical Co., Ltd.) 0.1 g, polyether phosphate-based surfactant 3.9 g of an agent (manufactured by Nippon Ludrich: Solspice 41000) was stirred to obtain a formed solution.
[0079] The content of silicon alkoxide (tetraethoxysilane) in the solution (in terms of silicon dioxide), proton concentration, water content, organic polymer (hydrophilic organic polymer) content, etc., are shown in Table 1. . In addition, the water content (0.35 mass %) contained in ethanol was added to the water content and calculated. Proton concentration, calculated as the protons cont...
Embodiment A2
[0085] In Example A2, ethyl silicate was used together with tetraethoxysilane as a silica raw material.
[0086] To 30.02 g of ethanol (manufactured by Katayama Chemical), 22.57 g of tetraethoxysilane (manufactured by Shin-Etsu Chemical), 16.25 g of ethyl silicate 40 (manufactured by Colcott), 27.16 g of concentrated hydrochloric acid (35% by mass) of pure water were added. , manufactured by Kanto Chemical) 0.1 g of a polyether phosphate-based surfactant (manufactured by Japan Ludrich: Solus Pas 41000) 3.9 g was stirred to obtain a formed solution. The proton concentration and the like in this solution are shown in Table 1.
[0087] The "ethyl silicate 40" used here is represented by the following formula (1), and is a colorless and transparent liquid containing 40% by weight of a silica component (SiO2). In addition, in addition to chain-structure condensates, branched or cyclic-structure condensates are also included. Polymers of silicon alkoxide represented by "Ethyl sili...
Embodiment A3
[0093] In Example A3, polyethylene glycol was used instead of the polyether phosphate ester surfactant, and phosphoric acid was added as a raw material of phosphorus.
[0094] In 23.69 g of ethanol (manufactured by Katayama Chemical), 45.14 g of tetraethoxysilane (manufactured by Shin-Etsu Chemical), 27.16 g of pure water, 0.1 g of concentrated hydrochloric acid (35% by mass, manufactured by Kanto Chemical), phosphoric acid (85% by mass, Kanto Chemical Co., Ltd.) 0.11 g of polyethylene glycol 4000 (Kanto Chemical Co., Ltd.) 3.81 g was stirred to obtain a forming solution. The proton concentration and the like in this solution are shown in Table 1.
[0095] In addition, "polyethylene glycol 4000" used here is polyethylene glycol whose weight average molecular weight is 4000.
[0096] Next, the forming solution was applied by a flow coating method on a cleaned soda lime silicate glass substrate (100×100 mm) at room temperature at a humidity of 30%. In this state, after drying ...
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Abstract
Description
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Application Information

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