Photoimageable composition
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- SHIPLEY CO LLC
- Publication Date
- 2005-02-03
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
BACKGROUND The present invention relates generally to photoimageable compositions. In particular, the present invention relates to photoimageable silsesquioxane compositions. Photoresists are photosensitive films used for transfer of images to a substrate. A coating layer of a photoresist is formed on a substrate and the photoresist layer is then exposed through a photomask to a source of activating radiation. The photomask has areas that are opaque to activating radiation and other areas that are transparent to activating radiation. Exposure to activating radiation provides a photoinduced chemical transformation of the photoresist coating to thereby transfer the pattern of the photomask to the photoresist-coated substrate. Following exposure, the photoresist is developed to provide a relief image that permits selective processing of a substrate. A photoresist can be either positive-acting or negative-acting. For most negative-acting photoresists, those coating layer portions tha...