Photoimageable composition

a composition and composition technology, applied in the field of photoimageable compositions, can solve the problems of increasing resist thickness over diffusion steps on substrates, affecting the depth of focus of exposure tools, and affecting the accuracy of etching patterns, so as to achieve the effect of improving lithographic performance and lowering dissolution rates
US20050026077A1Inactive Publication Date: 2005-02-03SHIPLEY CO LLC

Patent Information

Authority / Receiving Office
US · United States
Patent Type
Applications(United States)
Current Assignee / Owner
SHIPLEY CO LLC
Publication Date
2005-02-03
Estimated Expiration
Not applicable · inactive patent

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Abstract

Disclosed are photoimageable compositions containing silsesquioxane binder polymers and photoactive compounds, methods of forming relief images using such compositions and methods of manufacturing electronic devices using such compositions. Such compositions are useful as photoresists and in the manufacture of optoelectronic devices.
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Description

BACKGROUND The present invention relates generally to photoimageable compositions. In particular, the present invention relates to photoimageable silsesquioxane compositions. Photoresists are photosensitive films used for transfer of images to a substrate. A coating layer of a photoresist is formed on a substrate and the photoresist layer is then exposed through a photomask to a source of activating radiation. The photomask has areas that are opaque to activating radiation and other areas that are transparent to activating radiation. Exposure to activating radiation provides a photoinduced chemical transformation of the photoresist coating to thereby transfer the pattern of the photomask to the photoresist-coated substrate. Following exposure, the photoresist is developed to provide a relief image that permits selective processing of a substrate. A photoresist can be either positive-acting or negative-acting. For most negative-acting photoresists, those coating layer portions tha...

Claims

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