Method for Manufacturing Ultra-Hydrophilic Thin Film Coated Metal Film Coated Metal Product
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[0047] Preparation of Plasma Coating Film
[0048] After 10−3 Torr of vacuum was formed in the coating chambers 2 by using the vacuum pumps, the metal sheets 8 were connected to anodes and maintained at a predetermined distance (30 to 150 mm) from the electrodes 6 and 6a, and the heater coils 42 and 42a of the bubblers 40 were electrically heated (80 to 120° C.) to bubble the liquid-phase precursors. The hot wires 64, 64a, 68 and 68a coiled around the outer walls of the tubes 60, 60a, 66 and 66a were electrically heated (80 to 120° C.) to prevent the titanium precursor and the silicon precursor from being condensed on the inner walls of the tubes 60, 60a, 66 and 66a. The gas-phase precursor gas, the carrier gas and the reactive gas were injected into the coating chambers 2 through the tubes, and discharged in the up / down direction of the metal sheet 8. When a target vacuum degree was obtained by the injected gas, power was turned on to generate the plasma by the mixed gas between the ...
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