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Polymer, radiation sensitive resin composition and spacer for liquid crystal display element

A resin composition and polymer technology, applied in electrical components, nonlinear optics, photosensitive material processing and other directions, can solve the problem of the storage stability of the photosensitive resin composition, the solubility of the developer, and the solubility of the developer. There are problems such as problems, to achieve the effect of superior heat resistance, high reliability, and high resolution

Active Publication Date: 2008-02-27
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when such an epoxy resin is added, there are problems with the storage stability of the photosensitive resin composition or the solubility to the developing solution.
[0009] As mentioned above, the conventional radiation-sensitive resin composition, by adding an epoxy compound, can improve the adhesion to the substrate and chemical resistance (resistance to the alignment film stripping solution), but the storage stability or the dissolution of the developing solution sexual problems

Method used

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  • Polymer, radiation sensitive resin composition and spacer for liquid crystal display element
  • Polymer, radiation sensitive resin composition and spacer for liquid crystal display element
  • Polymer, radiation sensitive resin composition and spacer for liquid crystal display element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0219] Hereinafter, the embodiment of the present invention will be further described in detail by taking the implementation as an example. Here, parts and % are based on weight.

Synthetic example 1

[0221] Put 5 parts of 2,2'-azobisisobutyronitrile, 250 parts of 3-methoxybutyl acetate in a flask with a cooling tube and a stirrer, then put 18 parts of methacrylic acid, tricyclic methacrylic acid [5.2.1.0 2，6 ] 25 parts of dec-8-ester, 5 parts of styrene, 5 parts of butadiene, 25 parts of 2-hydroxyethyl methacrylate, 22 parts of tetrahydrofuran-2-yl methacrylate, carry out nitrogen replacement, and then slowly While stirring slowly, the temperature of the solution was raised to 80° C., and the temperature was maintained for 5 hours to carry out polymerization to obtain a solution of a copolymer [α-1] having a solid content concentration of 28.5%.

[0222] The Mw of the obtained copolymer [α-1] was measured by GPC (gel permeation chromatography) HLC-8020 (trade name, manufactured by Tonichi Co., Ltd.), and it was 14,000.

[0223] Next, 10 parts of 1,1-(bisacryloyloxymethyl)ethyl isocyanate (trade name KARENZ BEI, manufactured by Showa Denko Co., Ltd.), 4-methanol was added ...

Synthetic example 2

[0225] 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 250 parts of diethylene glycol methyl ethyl ether, and then methyl Acrylic acid 18 parts, methacrylic acid tricyclic [5.2.1.0 2，6 ] 20 parts of dec-8-yl ester, 5 parts of styrene, 5 parts of butadiene, 5 parts of glycidyl methacrylate, 25 parts of 2-hydroxyethyl methacrylate, tetrahydrofuran-2-yl methacrylate 22 parts, carried out nitrogen replacement, then while slowly stirring, the temperature of the solution was raised to 70°C, and the temperature was maintained for 5 hours to carry out polymerization to obtain a copolymer [α-2] solution with a solid content concentration of 28.3%. .

[0226] Mw of the obtained copolymer [α-2] was measured by GPC (gel permeation chromatography) HLC-8020 (trade name, manufactured by Tonichi Co., Ltd.), and it was 9,000.

[0227] Next, 10 parts of 1,1-(bisacryloxymethyl)ethyl isocyanate and 0.1 part of 4-methoxyphenol were added to 100 parts of the copolymer [α-2] solution,...

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PUM

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Abstract

To provide a radiation-sensitive resin composition providing a sufficient spacer shape even by a little exposure, and enabling the spacer for a liquid crystal display element having excellent elastic recovery, rubbing resistance, adhesion to a transparent substrate, heat resistance or the like, and sufficiently exhibiting resistance to stripping liquid at stripping of an oriented film to be formed. The polymer [A] is obtained by reacting a monoisocyanate compound containing a (meth)acryloyloxy group with a copolymer of (a1) an unsaturated carboxylic acid and / or an unsaturated carboxylic anhydride, (a2) an unsaturated compound having one or more hydroxy groups in one molecule, and (a3) other unsaturated compounds. The radiation-sensitive resin composition contains the polymer [A], a polymerizable unsaturated compound [B] and a radiation-sensitive polymerization initiator [C].

Description

technical field [0001] The present invention relates to a side chain unsaturated polymer which is very suitable for forming a spacer in a liquid crystal display element, a radiation-sensitive resin composition comprising the side chain unsaturated polymer, a spacer, a method for forming the same, and a liquid crystal display element. Background technique [0002] In conventional liquid crystal display elements, spacers such as glass beads or plastic beads having a specific diameter are used in order to maintain a constant distance between two substrates (cell gap). However, since these spacers are scattered randomly on a transparent substrate such as a glass substrate, if there are spacers in the pixel formation region, the spacer reflection phenomenon will occur, or the incident light will be scattered, and it will appear as a liquid crystal display. The problem of low contrast of components. [0003] Therefore, in order to solve such a problem, a method of forming a spac...

Claims

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Application Information

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IPC IPC(8): C08F8/30G02F1/1339G03F7/20G03F7/26
CPCG03F7/0007G03F7/0045G03F7/027G03F7/035
Inventor 一户大吾米仓勇志保浩司
Owner JSR CORPORATIOON