Conductive, plasma-resistant member

Abstract

An electrically conductive, plasma-resistant member adapted for exposure to a halogen-based gas plasma atmosphere includes a substrate having formed on at least part of a region thereof to be exposed to the plasma a thermal spray coating composed of yttrium metal or yttrium metal in admixture with yttrium oxide and / or yttrium fluoride so as to confer electrical conductivity. Because the member is conductive and has an improved erosion resistance to halogen-based corrosive gases or plasmas thereof, particle contamination due to plasma etching when used in semiconductor manufacturing equipment or flat panel display manufacturing equipment can be suppressed.

Description

technical field

[0001] The present invention relates to an electrically conductive, plasma-resistant component capable of resisting attack by a halogen-based plasma and having a coating providing electrical conductivity, wherein at least a part of the component to be exposed to the plasma has a coating formed by thermal spraying thereon, The coating is made from metal yttrium, a mixture of metal yttrium and yttrium oxide, a mixture of metal yttrium and yttrium fluoride, or a mixture of metal yttrium and yttrium oxide and yttrium fluoride. Such members may be suitable for use, for example, in semiconductor manufacturing equipment or in flat panel display manufacturing equipment (for example, equipment used to manufacture liquid crystal displays, organic electroluminescent devices, or inorganic electroluminescent devices) exposed to plasma components or parts. Background technique

[0002] In order to prevent workpieces from being contaminated by impurities, semiconductor man...