Dissipated metal indium chloride/chloridization 1-methyl-3-butyl imidazole system plating solution

A technology of scattered metal and butylimidazole, applied in the field of electroplating solution of scattered metal indium chloride/1-methyl-3-butylimidazole chloride system, can solve the problems of high energy consumption, high temperature operation, environmental pollution, etc. Achieve the effect of reducing pollution, low melting point, and little pollution

Inactive Publication Date: 2008-09-24
SHENYANG NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Traditional smelting, refining and alloy preparation methods can no longer fully meet the needs of today's production of scattered metals and their alloys, and traditional methods al

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] Indium (In): 80

[0017] Anhydrous Indium Chloride InCl 3 :340

[0018] 1-methyl-3-butylimidazole chloride (MBIC): 269

[0019] Ethylene glycol: 250

[0020] Gelatin: 1

[0021] Dextrin: 20

[0022] Sodium chloride (NaCl): 40

[0023] The above components were taken and mixed into 1000 g of a dispersed metal indium chloride / 1-methyl-3-butylimidazole chloride system electroplating solution.

Embodiment 2

[0025] Indium (In): 90

[0026] Anhydrous Indium Chloride InCl 3 :293

[0027] 1-methyl-3-butylimidazole chloride (MBIC): 360

[0028] Ethylene glycol: 200

[0029] Gelatin: 2

[0030] Dextrin: 25

[0031] Sodium chloride (NaCl): 30

[0032] The above components were taken and mixed into 1000 g of a dispersed metal indium chloride / 1-methyl-3-butylimidazole chloride system electroplating solution.

Embodiment 3

[0034] Indium (In): 100

[0035] Anhydrous Indium Chloride InCl 3 : 230

[0036] 1-methyl-3-butylimidazole chloride (MBIC): 277

[0037] Ethylene glycol: 300

[0038] Gelatin: 3

[0039] Dextrin: 40

[0040] Sodium chloride (NaCl): 50

[0041] The above components were taken and mixed into 1000 g of a dispersed metal indium chloride / 1-methyl-3-butylimidazole chloride system electroplating solution.

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Abstract

Dissipated metal indium chloride/chlorination 1- methyl-3-butyl-imidazole system plating liquid (g.kg<-1>) is formed by the following materials: 80 to 100 portions of the metal indium (In), 230 to 430 portions of anhydrous InCl3, 180 to 360 portions of the chlorination 1- methyl-3-butyl-imidazole (MBIC), 200 to 300 portions of glycol, 1 to 3 portions of isinglass, 20 to 40 portions of dextrine as well as 30 to 50 portions of sodium chloride(NaCl). Ion liquid is a novel green solvent and the indium-plated liquid researched by utilizing the room temperature ion liquid of the dissipated metal has a plurality of specific properties like lower melting point, adjustable Lewis acidity, excellent conductive property, negligible steam pressure, wider using temperature, special solubility, etc. the indium-plated liquor does not have the problems of hydrating, hydrolyzing and hydrogen evolution and has the properties of no corrosion and low pollution that should be prepared by a green solvent. The fine indium quality is improved to a large extent and the purity of the indium can reach 99.99 percent by using the plating liquid to plate indium.

Description

Technical field: [0001] The invention relates to an electroplating solution, in particular to an electroplating solution of a dispersed metal indium chloride / 1-methyl-3-butylimidazole chloride system. Background technique: [0002] Scattered metals refer to a series of rare metal elements, including gallium (Ga), indium (In), thallium (Tl), germanium (Ge), selenium (Se), tellurium (Te) and rhenium (Re). Scattered metals are my country's superior resources. From the perspective of the use of indium, its elemental metal and alloy have many special properties. Indispensable emerging materials in cutting-edge technology fields such as energy and energy. The production and processing of these materials are inseparable from high-purity metal indium. High-purity metal indium generally requires the purity of indium to reach 99.999%, or even more than 99.9999%. The current production of refined indium in my country is only 99.99%, and the research and development of high-purity met...

Claims

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Application Information

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IPC IPC(8): C25D3/54
Inventor 田鹏黄涛刘丽艳段纪东王倩吕子健赵启程
Owner SHENYANG NORMAL UNIV
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