Glass-hard low-frictional coefficient nano-multi-layer amplitude modulation structure coating and preparation method thereof

A technology with low friction coefficient and multi-layer structure, which is applied in the direction of coating, layered products, sputtering coating, etc., can solve the problems that need to be further studied and improved, and the mechanism of coating performance change is different, so as to achieve accurate coating Composition, process stability, high reproducibility effect

Inactive Publication Date: 2009-02-18
NINGBO UNIVERSITY OF TECHNOLOGY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The researchers prepared Cr-Si-N coatings with different structures by cathode arc, ordinary magnetron sputtering, mosaic target magnetron sputtering, unbalanced magnetron sputtering and other methods, but the addition of silicon to the CrN coating There are different opinions on the me...

Method used

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  • Glass-hard low-frictional coefficient nano-multi-layer amplitude modulation structure coating and preparation method thereof
  • Glass-hard low-frictional coefficient nano-multi-layer amplitude modulation structure coating and preparation method thereof
  • Glass-hard low-frictional coefficient nano-multi-layer amplitude modulation structure coating and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Polish the M42 high-speed steel substrate with a hardness of HRC61-63 with 1 μm diamond abrasive paste, and perform ultrasonic cleaning in acetone solution together with (100) single crystal silicon wafers for 20 minutes, and put it into the one-axis rotation of the vacuum chamber of the coating equipment on the sample holder (e.g. Figure 10 shown). Under the condition of 500V bias, the surface of the substrate was cleaned by plasma bombardment for 20 minutes, and then the Cr interface layer was prepared, and the vacuum degree of the back was 2×10 -2 Torr, argon gas flow rate 10sccm, Cr target input power 2kW, bias voltage -60V, plating time 25min. Then pass through nitrogen to form a CrN transition layer for 60 minutes, and other parameters are the same as when preparing the Cr interface layer. Then turn on the Si target, the input power of the Si target is 0.32kW, and other parameters are the same as the previous step. During the entire plating process, the parame...

Embodiment 2

[0039] The input power of the Si target was adjusted to 0.40kW, and all other implementation processes and parameters were the same as those in Embodiment 1.

Embodiment 3

[0041] The input power of the Si target was adjusted to 0.48kW, and all other implementation processes and parameters were the same as those in Embodiment 1.

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Abstract

The invention belongs to a surface engineering technology and in particular relates to a high-hardness and low-friction coefficient plating layer with a nanometer multilayered amplitude modulation structure and a method for preparing the same. A Cr-Si-N plating layer is plated by an unbalance magnetron sputtering ion plating method in a closed magnetic field. In preparation, the input power of Cr target current is 2 kilowatts; and the input power of Si target current is changed within the range between 0.3 and 0.7 kilowatt so as to adjust the content of silicon in the plating layer. When a CrN transition layer and the Cr-Si-N plating layer are deposited, the flow of the introduced argon gas is 10 sccm; and the bias voltage of direct current pulse is 60 volt below zero. When the CrN transition layer and the Cr-Si-N plating layer are deposited, the flow of nitrogen gas is used and positioned in a light emission spectrum device on the near surface of the Cr target for carrying out the closed-loop control so as to accurately modulate the compositions of the plating layer. The plating layer has the nanometer multilayered amplitude modulation structure which in turn consists of a base layer, a Cr interface layer, a CrN transition layer and a Cr-Si-N amplitude modulation structural layer with CrN and Si3N4 arranged outwards at intervals; the outermost layer is the Cr-Si-N amplitude modulation structural layer, wherein the amplitude modulation wavelength of the Cr-Si-N amplitude modulation structural layer is less than 50 nanometers; the hardness is larger than 20 GPa; the highest hardness exceeds 20 GPa; and the Cr-Si-N amplitude modulation structural layer has excellent film-based binding strength (a scuffing method determines that the critical load is larger than 85 newtons) and has friction coefficient of less than 0.5 between WC balls. A plating layer material can be used for mechanical parts under the condition of high-load service and cutters.

Description

technical field [0001] The invention relates to a Cr-Si-N coating with high hardness and low friction coefficient nanometer multi-layer amplitude modulation structure and a preparation method thereof, belonging to the technical field of material preparation. Background technique [0002] CrN has attracted people's attention due to its good wear resistance, high temperature oxidation resistance and corrosion resistance. Al, Ti, Mo, Ta, Nb, W and other elements can be added to CrN-based coatings to form Cr-Al-N, Cr-Ti-N, Cr-Mo-N, Cr-Ta-N, CrNbN, CrWN and other ternary coatings. If the ternary (or multi-component) coating after adding the above elements forms a multi-layer amplitude modulation structure, then the multi-layer structure nitride coating can overcome the deficiency in the performance of a single coating, and give full play to the advantages of different added components to improve hardness, Abrasion resistance and high temperature performance purposes. [0003] E...

Claims

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Application Information

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IPC IPC(8): B32B33/00B32B9/00B32B7/02C23C14/35C23C14/14C23C14/06C23C14/54
Inventor 鲍明东徐雪波
Owner NINGBO UNIVERSITY OF TECHNOLOGY
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