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Method for preparing nano composite multiple layer hard film

A nano-composite, hard technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of high requirements for synthesis equipment, time-consuming, low sputtering efficiency, etc., and achieve low cost, Effect of reducing noise and improving sputtering efficiency

Inactive Publication Date: 2009-06-10
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The preparation of multi-layer hard films by double-target or multi-target reactive magnetron sputtering generally requires high synthesis equipment. At the same time, mechanical equipment for rotating the sample stage is required, which is noisy; and it is necessary to empty the workpiece when rotating. It takes a certain amount of time, and the actual sputtering efficiency is low

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  • Method for preparing nano composite multiple layer hard film
  • Method for preparing nano composite multiple layer hard film
  • Method for preparing nano composite multiple layer hard film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] Embodiment one: prepare MoNx / Mo composite multi-layer hard film, see figure 1 shown

[0035] (1), the surface of the substrate substrate is polished, cleaned and dried;

[0036]The substrate substrate can choose to cut the steel sheet used in the industry, that is, the wire-cut or laser-cut high-speed steel / stainless steel sheet (10mm in diameter, 3mm in thickness) with metallographic sandpaper from coarse to fine, from 300 mesh to 3000 The objects are polished in turn, and polished with diamond paste on the polishing machine until the surface is smooth without scratches, and then degreased with acetone or ethanol solution to dissolve impurities attached to the surface of the substrate, and then mixed with hydrochloric acid, hydrogen peroxide and deionized water. Soak in liquid (volume ratio 1:2:5) for 6 hours, take it out, wash it with deionized water, and then ultrasonically clean it, then dry it on a desktop glue homogenizer for use.

[0037] The substrate substrat...

Embodiment 2

[0046] Embodiment two: prepare MoCx / MoCNx nanocomposite multi-layer hard film, see appendix figure 2 shown;

[0047] (1) The substrate substrate is made of high-speed steel sheet (10mm in length and 2mm in width) that is wire-cut or laser-cut, and polished with metallographic sandpaper from coarse to fine, from 300 mesh to 3000 mesh , polished with diamond paste on a polishing machine until the surface is smooth without scratches, then degreased with acetone or ethanol solution to dissolve impurities attached to the surface of the substrate, and then in a mixed solution composed of hydrochloric acid, hydrogen peroxide and deionized water (volume ratio 1:2:5) for more than 6 hours, wash off the residual liquid with deionized water, then use ultrasonic cleaning, and dry it on a desktop glue homogenizer before use. The substrate substrate also uses a silicon wafer with a purity of 99.99%, which is cut into 8 x 8mm with a glass knife 2 size, wash and tumble dry ready to use.

...

Embodiment 3

[0055] Embodiment Three: Preparation of MoCNx nanocomposite homogeneous multilayer film, see attached image 3 shown

[0056] (1), the surface of the substrate substrate is polished, cleaned and dried;

[0057] The substrate substrate selects the steel sheet used in the cutting knife and cutting tool industry, that is, the wire-cut or laser-cut high-speed steel / stainless steel sheet (10mm in diameter, 3mm in thickness) with metallographic sandpaper from coarse to fine, from 300 Grind in sequence from mesh to 3000 mesh, and polish with diamond nano-scale abrasive paste on the polishing machine until the surface is smooth without scratches, then degrease with acetone or ethanol solution to dissolve impurities attached to the surface of the substrate, and then wash with hydrochloric acid, hydrogen peroxide and Soak in a mixture of deionized water (volume ratio 1:2:5) for more than 6 hours, wash with deionized water, and then use ultrasonic cleaning for 15 minutes, then dry it on...

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Abstract

The invention relates to a method for preparing a multilayer hard film. The method comprises the following steps: (1) polishing, washing and drying the surface of a substrate; (2) placing the washed substrate in a vacuum chamber, and vacuumizing the vacuum chamber; (3) opening a heat power supply to heat the substrate, introducing sputtered gas argon into the vacuum chamber, adjusting film coating power, and carrying out the first layer sputtering sedimentation on the substrate; (4) after sedimentation in first setting period, selecting a state in second period or reaction parameter setting, or opening a reaction gas nitrogen, or under a condition of introducing the reaction gas, changing total air pressure in the vacuum chamber, or changing the prior substrate temperature, or changing a ratio of the reaction gas and the sputtering gas; and (5) cooling and annealing. The method prepares the nanometer composite multilayer hard film by a single-target magnetron sputtering device, reduces the requirement on synthetic equipment, does not need mechanical equipment to make a sample holder rotated, and reduces noise pollution to environment and production cost.

Description

technical field [0001] The invention relates to a method for preparing a nanocomposite multilayer hard film, which belongs to the technical field of hard film materials. Background technique [0002] At present, nitride hard films are used as surface protection materials for knives, cutting tools and molds, and a variety of films with adjustable specific components and structures have been obtained in terms of synthesis methods and preparation technologies. From the perspective of material design, people always tend to develop thin films with lower cost and industrialization, and have explored a lot in this field. [0003] The advantages that nitrides offer in engineered materials are numerous. First of all, because the chemical covalent bond formed by the nitride leads to its high chemical stability, it has good mechanical strength and superhardness. Secondly, the bonding force between the nitride and the general substrate material is very strong, the formed film is not e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/54
Inventor 吕鹏辉方前锋倪浩明刘庆汪爱英
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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