Method for preparing quantum dot light-wave conversion layer on the surface of silica-based solar cell

A solar cell, light wave conversion technology, applied in coatings, circuits, electrical components, etc., can solve the problems of solar energy loss, low quantum efficiency, etc., to improve photoelectric conversion efficiency, high photoelectric conversion rate, and photoelectric conversion rate. Effect

Inactive Publication Date: 2011-03-30
上海纳晶科技有限公司
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The energy gap of silicon is 1.12V, crystalline silicon solar cells mainly absorb light from 400nm to 900nm, and have a very low quantum efficiency for light below 400nm (purple light and ultraviolet light), thus causing a great loss of solar energy below 400nm

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing quantum dot light-wave conversion layer on the surface of silica-based solar cell
  • Method for preparing quantum dot light-wave conversion layer on the surface of silica-based solar cell
  • Method for preparing quantum dot light-wave conversion layer on the surface of silica-based solar cell

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] The CdS quantum dot material is mixed into the silica sol to prepare the quantum dot light-wave conversion composite material, and then coated on the surface of the silicon-based solar cell to form a quantum dot light-wave conversion layer. The preparation includes the following steps:

[0035] a. Preparation of silica sol

[0036] Take 10mL of tetraethyl orthosilicate with a concentration of 1.27mol / L, 25mL of absolute ethanol, 0.25ml of 2mol / L hydrochloric acid and 8mL of deionized water and mix them, and then use the hot solvent method to magnetically store the mixed solution in a water bath at 50°C. Stir for 3 hours to obtain a sol solution of silicon dioxide.

[0037] b. Preparation of CdS quantum dot nanomaterials

[0038] Get 3.2mmol / L cadmium chloride (CdCl2 2.5H2O) solution 25ml and quality are 5% polyvinylpyrrolidone solution (PVP) 10ml at room temperature and stir 2 hours, then 3.2mmol / L sodium sulfide (Na2S . 9H2O) solution 15ml was added dropwise in the a...

Embodiment 2

[0046] The CdTe quantum dot material is mixed into the silica sol to prepare the quantum dot light-wave conversion composite material, and then coated on the surface of the silicon-based solar cell to form a quantum dot light-wave conversion layer. The preparation includes the following steps:

[0047] a. Preparation of silica sol

[0048] Take 10mL of tetraethyl orthosilicate with a concentration of 1.27mol / L, 25mL of absolute ethanol, 0.25ml of 2mol / L hydrochloric acid and 8mL of deionized water and mix them, and then use the hot solvent method to magnetically store the mixed solution in a water bath at 50°C. Stir for 3 hours to obtain a sol solution of silicon dioxide.

[0049] b. Preparation of CdTe quantum dot nanomaterials

[0050] Put 0.005mol Te powder in a beaker, add 10ml (2.2×10-1mol / L) sodium borohydride (NaBH4) aqueous solution, let it stand for a few minutes until the black Te powder gradually dissolves, forming a colorless and transparent NaHTe aqueous solution...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
viscosityaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses a method for preparing a quantum dot light-wave conversion layer on the surface of a silica-based solar cell, and the method is characterized by doping CdS or CdTe quantum dot materials into silicon dioxide solrubber to obtain compound materials of quantum dot light-wave conversion layer and then coating the compound materials on the surface of the silica-based solar cell to form the quantum dot light-wave conversion layer. The method includes the preparation of silicon dioxide solrubber and quantum dot nanomaterials, synthesis of compound materials and the coating of the surface of solar cell. The method has high light transmission rate, can convert violet rays and ultraviolet light below 400 nm in sunlight into visible light within 400-700 nm, greatly improves thephotoelectric conversion efficiency of the silica-based solar cell, and has the advantages of high photoelectric conversion rate of the quantum dot light-wave conversion layer, simple method and lowcost compared with the prior art.

Description

technical field [0001] The invention relates to a photoelectric composite material, in particular to a method for preparing a quantum dot light-wave conversion layer on the surface of a silicon-based solar cell. Background technique [0002] Solar energy will become an important source of energy in the 21st century. At present, there are two main bottlenecks in the development of solar cells: cost price and photoelectric conversion efficiency. To improve the photoelectric conversion efficiency of solar cells, it is mainly possible to reduce the non-absorption loss of the surface by optimizing the device design, such as incorporating the back surface field, strengthening light trapping technology, surface passivation technology, and making an anti-reflection film. However, the optimization of the structure of solar cell devices and the technology of anti-reflection coatings have been relatively mature, and there is not much room for further optimization to improve the photoel...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18C23C20/08
CPCY02P70/50
Inventor 孙卓潘丽坤程祖军曹美玲林丽锋
Owner 上海纳晶科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products