Compound semiconductor material doped with rare-earth elements and growth method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SUZHOU NANOWIN SCI & TECH
- Publication Date
- 2010-07-14
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
【Technical field】
[0001] The invention relates to the field of semiconductor materials, in particular to a compound semiconductor material doped with rare earth elements and a growth method thereof. 【Background technique】
[0002] The third-generation semiconductor material GaN and its related devices have broad application prospects in optical display, optical storage, laser printing, optical lighting, medical and military fields, so the third-generation semiconductor material represented by GaN is known as IT A new engine for the industry.
[0003] GaN is a wide band gap semiconductor with a band gap up to 3.4eV, so various rare earth ions can be doped into GaN without luminescence quenching. The luminescence band of rare earth ions can cover the region from ultraviolet to infrared, and the luminescence transition of rare earth ions mainly occurs between the partially filled 4f energy levels, which is less affected by the crystal field environment, the luminescence peak i...