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Micro gas chromatographic column with high depth-to-width ratio and wet corrosion manufacturing method thereof

A micro gas chromatography and high aspect ratio technology, which is applied in the field of high aspect ratio micro gas chromatography column and its wet etching, can solve the problems of inability to obtain deep groove structure, high price, and unsatisfactory miniaturization, and achieve the processing method Ease of operation and reduced processing costs

Inactive Publication Date: 2011-09-14
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, dry etching requires special equipment and is expensive
As for the low-cost wet processing method, only the University of Cincinnati in the United States has achieved a simple straight-shaped deep groove structure, but its column length is only 3cm, which seriously affects the separation efficiency.
The general requirement of micro-chromatography is to achieve the highest possible chromatographic separation effect in a volume as small as possible. The straight structure will not bend or twist. Even if the length is increased, it will not meet the requirements of miniaturization.
However, the spiral and loop patterns commonly used in dry etching cannot obtain deep groove structures in wet etching.

Method used

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  • Micro gas chromatographic column with high depth-to-width ratio and wet corrosion manufacturing method thereof
  • Micro gas chromatographic column with high depth-to-width ratio and wet corrosion manufacturing method thereof
  • Micro gas chromatographic column with high depth-to-width ratio and wet corrosion manufacturing method thereof

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Embodiment 1

[0030] The present invention will be further described below by taking specific materials and specific processes as examples, but this does not constitute a limitation to the present invention.

[0031] ①Making of mask: The groove of the chromatographic column is designed as a broken line, the length of the long side is 20mm, the angle between the long side and the short side is 70.53°, the interval between adjacent long sides is 80μm, the width of the groove is also 80μm, and the air inlet 1. The openings 6a and 7a of the vent holes on the silicon wafer have a width of 300 μm and a length of 2mm, so 150 long sides can be arranged in an area of ​​25mm×25mm, and the total length of the chromatographic channel can reach 3m.

[0032] ②Mask layer thin film preparation: Using PECVD process, put the cleaned P-type, (110) oriented monocrystalline silicon wafer as the substrate into the reaction gas chamber with a thickness of 500 μm ± 10 μm, and put silane and ammonia gas into it. 15...

Embodiment 2

[0039] The serpentine groove of the chromatographic column in this example has a total length of 0.5m. The chromatographic column of this length greatly reduces the separation time while retaining sufficient resolution, so it has important application value in fast and portable chromatographic instruments. The manufacturing process of this example is substantially the same as that of the previous example.

[0040] ①Mask making: The column groove is also designed as a 70.53° broken line, with a long side of 10mm, a total of 50 long sides, a groove width of 120μm, and an interval of 120μm between adjacent long sides, within an area of ​​12mm×12mm The total length of the chromatographic groove can be realized to be 0.5m.

[0041] ② Preparation of the mask layer film: the same process as in Example 1.

[0042] ③Lithography: In this example, the snake-shaped long side of the mask plate is strictly aligned with the crystal direction of the (110) silicon wafer. Also, since the angl...

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Abstract

The invention discloses a micro gas chromatographic column with high depth-to-width ratio and a wet corrosion manufacturing method thereof. In the micro gas chromatographic column, a broken line chromatographic groove is formed on a (110) single crystal silicon substrate, the included angle of the long and short edges of the broken line is 70.53 degrees, and the long and short edges are along the (110) and (112) crystal directions of the substrate respectively. Vertical deep grooves with high depth-to-width ratio are formed by adopting an anisotropic wet corrosion method in the broken line chromatographic column and bonded by silicon glass bonds, so that the whole broken line groove has high depth-to-width ratio; and long enough column length is realized in a small area. On the characteristic dimensions of depth-to-width ratio, column length, area and the like, the broken line deep groove is equivalent to a vertical deep groove processed by deep reactive ion etching (DRIE); and the adopted wet corrosion processing method is simple and feasible, expensive DRIE etching equipment is not needed, and the processing cost is greatly reduced.

Description

technical field [0001] The invention relates to the technical field of gas chromatography, in particular to a micro gas chromatography column with high aspect ratio and a manufacturing method thereof by wet etching. Background technique [0002] Gas chromatography is a technology for separating and identifying mixed gases. It was invented as early as the 1950s and is widely used in the fields of pharmaceuticals, oil exploration, environmental monitoring, material purification, and conventional organic compound analysis. [0003] A gas chromatograph is generally composed of a sample injector, a separation column, and a detector. The key component is the separation column, which determines the separation effect of the chromatograph. Traditional chromatographs mostly use quartz capillary as the separation column, and the inner wall of the separation column is coated or filled with a stationary phase. When the components of the mixture pass through the column with the carrier g...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N30/60B81C1/00
Inventor 杜晓松王力廖明杰蒋亚东
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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