The invention discloses a preparation method of a micro gas 
chromatographic column chip with a high 
aspect ratio. The method comprises the steps of manufacturing a 
metal pattern plate, preprocessing a 
silicon wafer, performing a uniform 
adhesive photolithography technology, and performing developing; then, 
sputtering a 
metal aluminum layer to be adopted as a masking layer, performing ultrasonic stripping, enabling a channel to be etched to be exposed, performing deep 
dry etching, and adjusting perpendicular 
etching and 
sedimentation protection parameters; performing 
anodic bonding on two substrates with identical 
etching graphs, 
sputtering a thin film heater and a temperature measuring 
resistor on the two faces of the substrates obtained after bonding is completed; forming a PDMS thin film inside a micro 
chromatographic column by adopting a static 
coating method. According to the obtained micro gas 
chromatographic column, the side wall is steep, the 
aspect ratio is large, the 
aspect ratio of the micro gas chromatographic column is increased by one time on the basis of original 
etching, the preparation method is simple and reliable, and the obtained micro gas chromatographic column 
chip is high in sensitivity and resolution ratio.