The invention discloses a preparation method of a micro gas
chromatographic column chip with a high
aspect ratio. The method comprises the steps of manufacturing a
metal pattern plate, preprocessing a
silicon wafer, performing a uniform
adhesive photolithography technology, and performing developing; then,
sputtering a
metal aluminum layer to be adopted as a masking layer, performing ultrasonic stripping, enabling a channel to be etched to be exposed, performing deep
dry etching, and adjusting perpendicular
etching and
sedimentation protection parameters; performing
anodic bonding on two substrates with identical
etching graphs,
sputtering a thin film heater and a temperature measuring
resistor on the two faces of the substrates obtained after bonding is completed; forming a PDMS thin film inside a micro
chromatographic column by adopting a static
coating method. According to the obtained micro gas
chromatographic column, the side wall is steep, the
aspect ratio is large, the
aspect ratio of the micro gas chromatographic column is increased by one time on the basis of original
etching, the preparation method is simple and reliable, and the obtained micro gas chromatographic column
chip is high in sensitivity and resolution ratio.