Ion beam sputtering method for preparing golden yellow decorative film, and film
A technology of ion beam sputtering and decorative film, applied in sputtering plating, ion implantation plating, metal material coating process, etc., can solve the problems of high cost of gold plating, easy fading, non-wear resistance, etc., and achieve dense plating , good gloss, low cost effect
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Embodiment 1
[0018] Example 1: use glass as a hard substrate, use a cotton swab to scrub, then ultrasonically in acetone for 20 minutes, and in deionized water for 40 minutes, and dry it in warm air before use, and set aside. Put it into the ion beam sputtering apparatus, start the vacuum system, and evacuate to 4.5×10 -6 Pa, add 70ml / min argon gas, wait for 15 minutes, apply voltage 600V to the cathode, and 50V to the anode, start ion beam bombardment, and clean the nickel target. After cleaning, turn off the anode voltage, start the low-energy ion source, apply a voltage of 150V to the anode, bombard the hard substrate, and clean it. After cleaning, apply a voltage of 60V to the anode and add nitrogen gas. The flow rate of nitrogen gas is 6ml / min, deposit for 1h, close the nitrogen valve, open the oxygen valve, flow rate is 6ml / min, deposit for 1h, close the oxygen valve, and turn off the voltage. The resulting film is a golden yellow bright film, the film made in a nitrogen atmosphere ...
Embodiment 2
[0019] Example 2: Same as Example 1, glass is used as the hard substrate. The previous work is the same as Example 1. In this example, the steps of depositing thin films are reversed, first depositing oxides, and then depositing nitrides. The manufactured object is golden yellow when viewed from the uncoated surface, which can be used as a golden mirror decoration, and it is bright silvery white when viewed from the coated film layer.
Embodiment 3
[0020] Example 3: Using aluminum foil as a hard substrate, the aluminum will first be degreased with acetone, and then chemically polished. The purpose of chemical polishing is to eliminate mechanical damage and corrosion spots on the surface of the sample, and improve the smoothness and gloss of the sample surface : The composition of the polishing liquid is: phosphoric acid: sulfuric acid: nitric acid = 73: 24: 3 (volume ratio), the temperature of the polishing liquid is 85-90°C, and the time is 2-3min. After polishing, rinse with tap water immediately, and the transfer time is controlled within 30s , the shorter the better, then rinse with distilled water and dry. Put it into the ion beam sputtering apparatus, start the vacuum system, and evacuate to 4.5×10 -6 Pa, add 70ml / min argon gas, wait for 15 minutes, apply voltage 600V to the cathode, and 50V to the anode, start ion beam bombardment, and clean the nickel target. After cleaning, turn off the anode voltage, start the...
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