Microspherical film preparation device and method of preparing boron carbide microspherical film and pellet by vacuum evaporation technique
A technology of thin film preparation and boron carbide, which is applied in the direction of vacuum evaporation plating, ion implantation plating, metal material coating technology, etc., can solve the problems of reducing the deposition rate of the film material and the surface damage of the film layer, so as to increase the deposition rate, The effect of uniform thickness and smooth inner and outer surfaces
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Embodiment 1
[0035] In this embodiment, the structure of the magnetic adsorption microsphere film preparation device is as follows figure 1 As shown, it includes a motor 1, a tie rod 2, a fixed disk 3, a magnet 4 and a screen cloth 5. The motor 1 is a model 80YYJP25-3 motor, the tie rod 2 is three, made of steel wire with a diameter of 1mm, the fixed plate 3 is a circular plate made of paulownia or polytetrafluoroethylene, and the magnet 4 is a samarium-cobalt magnet. 2.10×4.10×7.20mm 3 , the distance between adjacent magnets L≥20mm, the magnets 4 are installed on the fixed plate 3 and distributed at equal intervals, such as figure 2 As shown, the screen is 300 mesh stainless steel screen. The assembly method of each component and the installation position in the vacuum coating equipment are as follows: image 3 As shown: one end of each tie rod is connected with the rotating part of the motor 1 and distributed at equal intervals along the circumference of the motor rotating part, the ...
Embodiment 2
[0038] Boron carbide thin films were deposited on the ferromagnetic microsphere substrate at different rolling speeds (that is, at different positions).
[0039] (1) Preparation of microsphere substrate and film material
[0040] The ferromagnetic microsphere substrate used was provided by Zhejiang Shangyu Yuanyuan Steel Ball Co., Ltd., with a diameter of 1 mm. The ferromagnetic microsphere model was 440C, and the microsphere grade was 16.
[0041] The boron carbide film material used is granular (the particle size is about 3mm), and the purity is 99.5%, which is provided by Jiangxi Haite New Material Co., Ltd.
[0042] (2) Coating
[0043] The boron carbide film material is placed in the crucible of the electron beam evaporation equipment, and the ferromagnetic microsphere substrate 6 with a ball diameter of 1mm after cleaning and drying is adsorbed under the screen cloth 5 of the magnetic adsorption microsphere film preparation device and combined with The screen is in con...
Embodiment 3
[0046] (1) Preparation of microsphere substrate and film material
[0047] The used ferromagnetic microsphere substrate and boron carbide film material are the same as in Example 2.
[0048] (2) Coating
[0049] The boron carbide film material is placed in the crucible of the electron beam evaporation equipment, and the ferromagnetic microsphere substrate 6 with a ball diameter of 1mm after cleaning and drying is adsorbed under the screen cloth 5 of the magnetic adsorption microsphere film preparation device and combined with The screen is in contact so that the ferromagnetic microsphere substrate is located 30 cm above the crucible; close the vacuum chamber and evacuate to 3×10 -3 Pa, turn on the power switch and filament switch on the electric control cabinet in order, adjust the filament current at 0.3A, and warm up for 10 minutes; turn on the deflection and focus switches, select the high voltage as 6kV, adjust the beam current to 5mA, and adjust the deflection X axis, Y ...
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Abstract
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