Method for preparing double-component and double-layer nano lubrication thin film by taking nano-particle array as template
A nanoparticle array, lubricating thin film technology, applied in coating, manufacturing microstructure devices, metal material coating process, etc., can solve problems such as adhesion, affecting operation and service life, micro-friction, etc., to overcome agglomeration and expand use. , the effect of improving the carrying capacity
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Embodiment 1
[0021] Preparation of a single-component self-assembled bilayer thin film of valeric acid on the surface of aminated single crystal silicon
[0022] First soak the single crystal silicon surface of the single crystal silicon wafer in the piranha solution (by H 2 o 2 and concentrated H 2 SO 4 According to the volume ratio of 3:7 preparation), the hydroxylation was carried out, the temperature was controlled at 90 ° C, and the duration was 30 minutes; the hydroxylated single-crystal silicon wafer was taken out, ultrasonically cleaned in ethanol and acetone solutions in turn, and then blown dry with nitrogen; After drying, the hydroxylated monocrystalline silicon wafers were quickly soaked in a solution of triethoxysilane coupling agent with a concentration of 5mM for amination, and the duration was 24 hours. They were taken out and ultrasonically cleaned in ethanol and acetone solutions in turn; the amination surface The final monocrystalline silicon wafer was immersed in a s...
Embodiment 2
[0026] Preparation of a single-component self-assembled bilayer thin film of lauric acid on the surface of aminated single crystal silicon
[0027] First soak the single crystal silicon surface of the single crystal silicon wafer in the piranha solution (by H 2 o 2 and concentrated H 2 SO 4 According to the volume ratio of 3:7 preparation), the hydroxylation was carried out, the temperature was controlled at 90 ° C, and the duration was 30 minutes; the hydroxylated single-crystal silicon wafer was taken out, ultrasonically cleaned in ethanol and acetone solutions in turn, and then blown dry with nitrogen; After drying, the hydroxylated monocrystalline silicon wafers were quickly soaked in a solution of trimethoxysilane coupling agent with a concentration of 5mM for amination. The duration was 24 hours, and they were taken out and ultrasonically cleaned in ethanol and acetone solutions in turn; after amination of the surface The monocrystalline silicon wafer is immersed in ...
Embodiment 3
[0031] Preparation of a single-component self-assembled bilayer thin film of lauric acid on the surface of aminated single crystal silicon
[0032] First soak the single crystal silicon surface of the single crystal silicon wafer in the piranha solution (by H 2 o 2 and concentrated H 2 SO 4 According to the volume ratio of 3:7 preparation), the hydroxylation was carried out, the temperature was controlled at 90 ° C, and the duration was 30 minutes; the hydroxylated single-crystal silicon wafer was taken out, ultrasonically cleaned in ethanol and acetone solutions in turn, and then blown dry with nitrogen; After drying, the hydroxylated monocrystalline silicon wafers were quickly soaked into a trichlorosilane coupling agent solution with a concentration of 5 mM for amination, and the duration was 24 hours. They were taken out and ultrasonically cleaned in ethanol and acetone solutions in turn; Use the pulling method to immerse the single crystal silicon wafer in the gold so...
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