Organic photovoltaic cell taking sulfur-doped MoO3 film as anode interface layer and preparation method thereof
An organic photovoltaic cell and anode interface technology, applied in photovoltaic power generation, circuits, electrical components, etc., to achieve the effects of simple process and method, improved performance, and good thermal stability
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[0037] 1 Preparation of target
[0038] The purity is 99.9%MoS 2 Prepare a circular target with a thickness of 5 mm, that is, MoS 2 target.
[0039] 2 substrate processing
[0040] The substrate used in the test is a conductive glass sheet (ITO conductive glass, FTO conductive glass, AZO conductive glass, ITAZO conductive glass, flexible transparent plastic (polyester resin) coated with ITO, which is a commercially available product or known technology) (References : 1. Guojia Fang, Dejie Li, et al., Fabrication and characterization of ZAO thin films prepared by DC magnetron sputtering with a highly conductive ceramic target, J. Crystal Growth, 2003, 247(3-4): 393-400; 2. Nanhai Sun, Guojia Fang, Qiao Zheng, Mingjun Wang, Nishuang Liu, Wei Liu and Xingzhong Zhao, Transparent conducting ITAZO anode films grown by a composite target RF magnetron sputtering at room temperature for organic solar cells, Semiconductor Science&Technology, 2 085025), the substrate should be cleane...
Embodiment 1
[0055] (1) Cleaning coated with FTO (fluorine-doped SnO 2 ) Glass 1 of conductive film 2: first put the conductive glass piece into a solution containing detergent (such as Liby brand liquid detergent) and soak for 10 minutes, then scrub it repeatedly and rinse it with clean water; then polish it with polishing powder ; Then put them into containers containing deionized water, acetone and alcohol and ultrasonically for 20 minutes respectively; finally put them into deionized water and rinse them twice, then dry them with a nitrogen gun and dry them in an oven at 80°C to eliminate stress;
[0056] (2) MoO on FTO glass substrate 3 Preparation of thin films: the MoS 2 The target and the conductive glass substrate are loaded into the magnetron sputtering equipment, and the sputtering is carried out with a radio frequency power supply. The working conditions are: background vacuum (the background vacuum is the vacuum degree of the vacuum chamber before backfilling the working gas...
Embodiment 2
[0062] (1) Cleaning the glass coated with the FTO conductive film: Same as in Example 1.
[0063] (2) MoO on FTO glass substrate 3 Preparation of thin films: the MoS 2 The target and the conductive glass substrate are loaded into the magnetron sputtering equipment, and the sputtering is carried out with a radio frequency power supply. The working conditions are: background vacuum: 2×10 -3 Pa, the total flow rate of the sputtering atmosphere is 10sccm, O during sputtering 2 / (Ar+O 2 )=50%, substrate temperature: 300°C, sputtering working pressure: 1.0Pa, sputtering power at 100W, sputtering time 2min. Sulfur-doped MoO prepared under this preparation condition 3 The XPS diagram of thin film Mo3d is attached image 3 as shown in (b);
[0064] (3) Formulation of the organic photosensitive layer: the same as in Example 1.
[0065] (4) in MoO 3 Swing the organic film: same as Example 1.
[0066] (5) Preparation of electrode: Same as Example 1.
[0067] (6) Battery perform...
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