Preparation method of ferromagnetism enhanced BiFeO3 film
A ferromagnetic and thin-film technology, applied in the field of BiFeO3 thin film preparation, can solve the problems of structure and composition segregation, complex composition and crystal structure, difficulty in obtaining materials with a single phase, etc., and achieve the effect of easy structure control
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0032] Choose BiFeO with a diameter of 50mm and a thickness of 3mm 3 The ceramic target is used as the sputtering target, and the single crystal (100) oriented Pt / Ti / SiO 2 After ultrasonic cleaning, the / Si substrate was fixed on the base of the deposition chamber and sealed in the third-stage air pressure differential system of the cluster beam deposition system.
[0033] Use mechanical pump and molecular pump to pre-evacuate, so that the vacuum pressure of the deposition chamber is equal to 2×10 -5 Pa. Liquid nitrogen is introduced into the side wall of the gas-phase aggregation method cluster beam source chamber. After the chamber is fully cooled, argon gas is introduced through the inert gas inlet to make the chamber pressure reach 100Pa. Sources produced by magnetron sputtering containing high-density BiFeO 3 gas. In the condensation chamber, BiFeO 3 Gradually grow into clusters through the continuous collision with argon atoms, and the formed clusters are carried by...
Embodiment 2
[0038] Deposit BiFeO according to the process of implementation 1 3 , the difference is only that liquid nitrogen is introduced into the side wall pipeline of the cluster beam source chamber of the gas phase aggregation method. Magnetron sputtering in a cluster beam source produces high-density BiFeO 3 gas. The deposition time of the film is 30 minutes, and a nanocluster film with a thickness of 180 nanometers is formed on the substrate; the obtained film is annealed at 800° C. for 5 minutes in an oxygen atmosphere by a rapid heat treatment system.
Embodiment 3
[0040] Deposit BiFeO according to the process of implementation 1 3 , the difference is only that liquid nitrogen is introduced into the side wall pipeline of the cluster beam source chamber of the gas phase aggregation method. Magnetron sputtering in a cluster beam source produces high-density BiFeO 3 The gas, where the condensation distance is set to 100mm. The deposition time of the film is 50 minutes, and a nanocluster film with a thickness of 300 nanometers is formed on the substrate; the obtained film is annealed at 500° C. for 10 minutes under a nitrogen atmosphere by a rapid heat treatment system.
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com