Film system structure of moderate and high temperature solar energy selective absorption coating and production method thereof

A film structure and selective technology, applied in the direction of solar thermal power generation, solar thermal devices, coatings, etc., can solve the problem that the surface anti-reflection layer is not strong in anti-atmospheric environment, the preparation equipment and process are complex, and it is not suitable for large-scale industrial production and other issues, to achieve high light-to-heat conversion efficiency, maintain light performance, and improve anti-reflection effects

Active Publication Date: 2013-08-07
JIANGSU DOCTORXIA SOLAR ENERGY
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  • Description
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Problems solved by technology

However, its preparation equipment and process are complex, and these coatings have their own many shortcomings, and are not suitable for large-scale industrial production.
Moreover, the bonding strength between the film system and the substrate is poor, and the surface anti-reflection layer is not strong against the atmospheric environment, which is the main deficiency of this selective absorption coating.

Method used

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  • Film system structure of moderate and high temperature solar energy selective absorption coating and production method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] Embodiment 1, as attached figure 1 shown

[0049] A film structure of a medium-high temperature solar selective absorption coating, including a substrate 1, an ion-etched layer 2 integrated with the substrate 1 on one surface of the substrate 1, and an ion-etched layer 2 formed on the surface of the ion-etched layer 2 from the inside There are aluminum infrared reflective film layer 3, titanium nitride thermal diffusion barrier film layer 4, high metal content titanium oxynitride selective absorption film layer 5, low metal content titanium oxynitride selective absorption film layer 6, tetranitrogen Silicon trisilicon anti-reflection film layer 7, and silicon dioxide anti-reflection film layer 8.

[0050] The substrate 1 is a stainless steel or copper or aluminum metal substrate, or a glass substrate.

[0051] The thickness of the aluminum infrared reflective film layer 3 is in the range of 85-95 nm, the thickness of the titanium nitride thermal diffusion barrier film...

Embodiment 2

[0052] Example 2, see attached figure 1

[0053] A method for preparing a film structure of a medium-high temperature solar selective absorption coating, using a metal copper substrate 1 as a starting material, and using a vacuum magnetron sputtering coating machine as a processing device, the preparation method is as follows;

[0054] 1. Pretreatment of metal copper substrate 1

[0055] The copper foil substrate 1 is ultrasonically cleaned in an alkaline solution, rinsed with clean water, put into a weakly acidic solution for neutralization, and then undergoes chemical treatment to form a certain roughness on the surface of the substrate 1, increase the specific surface area of ​​the substrate 1, reduce The reflection of light can obtain a certain degree of structural "light trapping" and improve the absorptivity of the coating. Then the substrate 1 was dried and placed in a coating vacuum chamber to keep warm for 10 minutes at a temperature of 200°C. The background vacuum...

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Abstract

The invention discloses a production method of a film system structure of a moderate and high temperature solar energy selective absorption coating. The film system structure is characterized in that an ion etching layer, an aluminum infrared reflection film layer, a titanium nitride thermal diffusion barrier film layer, a titanium oxynitride absorbing film layer with high metal content, a titanium oxynitride absorbing film layer with low metal content, a silicon nitride antireflection film layer and a silicon dioxide antireflection film layer are sequentially arranged on one surface of a substrate. The production method of the film system structure is characterized in that firstly the surface of the metal copper substrate is etched, and then the aluminum infrared reflection film layer, the titanium nitride thermal diffusion barrier film layer, the titanium oxynitride absorbing film layer with high metal content, the titanium oxynitride absorbing film layer with low metal content, the silicon nitride antireflection film layer and the silicon dioxide antireflection film layer are sequentially plated. The production method has the advantages of being simple, easy to control, good in product quality, suitable for industrial mass production and the like.

Description

technical field [0001] The invention relates to a film system structure of a medium-high temperature solar selective absorption coating and a preparation method thereof, belonging to the solar heat utilization technology. Background technique [0002] The medium-high temperature solar selective absorption coating is a key technology for medium-high temperature application of solar energy. An excellent medium-high temperature solar selective absorption layer is required to meet the long-term recycling of the coating at a temperature of ≥200 ° C, and maintain good optical absorption performance, low emission performance and good weather resistance. [0003] In view of this, the medium-high temperature selective absorption coating, compared with the low-temperature absorption coating, should not only consider the high absorption rate and low emissivity of the material, but also consider the stability of the coating at high temperature. Based on the thermal properties, optical ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/35F24J2/50
CPCY02E10/40
Inventor 夏建业杨纪忠刘建超
Owner JIANGSU DOCTORXIA SOLAR ENERGY
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