Preparation method of submicron silica powder
A sub-micron, silica technology, applied in dyeing organosilicon compound treatment, dyeing physical treatment, dyeing low-molecular-weight organic compound treatment, etc. and other problems, to achieve the effect of low manufacturing cost, high production efficiency and short production cycle
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Embodiment 1
[0021] Embodiment 1, a kind of preparation method of submicron silicon dioxide, its steps are as follows:
[0022] (1) Dry grinding: select crystalline quartz or fused silica sand with a particle size of 2-40 mesh as raw materials and add them to a horizontal ball mill, and use alumina balls, silicon balls or zirconia balls as grinding media for dry grinding; after grinding The material is screened through the screen; the diameter of the grinding medium is 10-50mm; the mesh number of the screen is 200-300 mesh; the mass ratio of the raw material to the grinding medium is 1:1 during grinding, and the grinding time is 8-10 hours;
[0023] (2) Wet grinding: Mix the sieved material with dispersion medium and dispersant, put it into a horizontal sand mill, and use alumina balls, silicon carbide balls or zirconia balls as grinding media for wet grinding. The diameter of the grinding medium is 0.2-1.0mm; the dispersion medium is selected from one or more of water, ethanol, acetone, b...
Embodiment 2
[0026] Embodiment 2, a kind of preparation method of submicron silicon dioxide, its steps are as follows:
[0027] (1) Dry grinding: select crystalline quartz or fused silica sand with a particle size of 2-40 mesh as raw materials, add them to a horizontal ball mill, and use alumina balls, silicon balls or zirconia balls as grinding media for dry grinding; after grinding The material is screened through the screen; the diameter of the grinding medium is 10-50mm; the mesh number of the screen is 200-300 mesh; the mass ratio of the raw material and the grinding medium is 1: 4 during grinding, and the grinding time is 8-10 hours ;
[0028] (2) Wet grinding: Mix the sieved material with dispersion medium and dispersant, put it into a horizontal sand mill, and use alumina balls, silicon carbide balls or zirconia balls as grinding media for wet grinding. The diameter of the grinding medium is 0.2-1.0mm; the dispersion medium is selected from one or more of water, ethanol, acetone, ...
Embodiment 3
[0031] Embodiment 3, a kind of preparation method of submicron silicon dioxide, its steps are as follows:
[0032] (1) Dry grinding: select crystalline quartz or fused silica sand with a particle size of 2-40 mesh as raw materials, add them to a horizontal ball mill, and use alumina balls, silicon balls or zirconia balls as grinding media for dry grinding; after grinding The material is screened through the screen; the diameter of the grinding medium is 10-50mm; the mesh number of the screen is 200-300 mesh; the mass ratio of the raw material and the grinding medium is 1:2 during grinding, and the grinding time is 8-10 hours ;
[0033] (2) Wet grinding: Mix the sieved material with dispersion medium and dispersant, put it into a horizontal sand mill, and use alumina balls, silicon carbide balls or zirconia balls as grinding media for wet grinding. The diameter of the grinding medium is 0.2-1.0mm; the dispersion medium is selected from one or more of water, ethanol, acetone, b...
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Abstract
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