High-thermal-conductivity and high-pressure-resistance aluminum-based copper-clad plate and preparation method thereof
An aluminum-based copper-clad laminate, high withstand voltage technology, applied in the field of circuit boards, can solve the problems of lower product qualification rate, easy delamination of sheets, poor bonding force, etc., improve oxidation resistance, have promising development prospects, and solve brittleness problem effect
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Embodiment 1
[0034] The components and contents of the insulating and thermally conductive adhesive layer:
[0035] Epoxy resin: 50 parts (resin A: resin B=1:0.6)
[0036] Toughener: 2 parts (phenolic resin: nitrile rubber: acrylic rubber = 5: 2: 1.5)
[0037] Silane coupling agent: 2 parts
[0038] Curing agent: 3.5 parts (phenolic resin: diaminodiphenyl sulfone = 3:1)
[0039] Thermally conductive filler: 45 parts (94% aluminum oxide, 3.2% silicon dioxide, 2.6% silicon carbide)
[0040] The preparation method of the aluminum-based copper-clad laminate: prepare the heat-conducting glue according to the above-mentioned components and content ratio, apply the prepared heat-conducting glue evenly on the release carrier material through the coating machine, and bake the semi-cured film at 70°C. A thermally conductive adhesive film is formed; the surface layer of the aluminum plate is anodized to obtain a uniform and dense oxide film; the adhesive layer, the insulating thermally conductive ...
Embodiment 2
[0042] The components and contents of the insulating and thermally conductive adhesive layer:
[0043] Epoxy resin: 70 parts (resin A: resin B=1:0.6)
[0044] Toughener: 5 parts (phenolic resin: nitrile rubber: polyurethane=4:3:2.5)
[0045] Silane coupling agent: 1 part
[0046] Curing agent: 6 parts (ie diaminodiphenyl sulfone)
[0047]Thermally conductive filler: 30 parts (98% aluminum oxide, 1% silicon dioxide, 0.2% silicon carbide, 0.8% magnesium oxide)
[0048] The preparation method of the aluminum-based copper-clad laminate: prepare a heat-conducting adhesive solution according to the above-mentioned components and content ratios, bake and semi-cure at 60°C to form a heat-conducting adhesive film, and heat-press at 200°C. The rest of the preparation process is the same as in Example 1.
Embodiment 3
[0050] The components and contents of the insulating and thermally conductive adhesive layer:
[0051] Epoxy resin: 40 parts
[0052] Toughener: 3 parts (nitrile rubber: acrylic rubber = 2: 1.5)
[0053] Silane coupling agent: 3 parts
[0054] Curing agent: 3 parts (ie diaminodiphenylamine)
[0055] Thermally conductive filler: 40 parts (63% aluminum oxide, 10% silicon dioxide, 5% silicon carbide, 20% aluminum nitride, and 2% magnesium oxide)
[0056] The preparation method of the aluminum-based copper-clad laminate: prepare a heat-conducting adhesive solution according to the above-mentioned components and content ratios, bake and semi-cure at 80°C to form a heat-conducting adhesive film, and heat-press at 220°C. The rest of the preparation process is the same as in Example 1.
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