Etching solution for selectively etching gallium arsenide solar cell cap layer and preparation method thereof

A technology of solar cells and gallium arsenide, which is applied in the direction of chemical instruments and methods, circuits, electrical components, etc., can solve problems such as difficult control, increase in battery chip resistance, and grid line shedding, so as to reduce preparation costs and enhance uniformity , Good repeatable effect

Inactive Publication Date: 2014-12-03
XIAMEN CHANGELIGHT CO LTD
View PDF7 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But no matter what kind of system, there are corrosion unclean, such as attached figure 2 Shown is a schematic diagram of the grid lines of the concentrating gallium arsenide triple-junction solar cell chip etched by the existing citric acid-hydrogen peroxide system selective etching solution under a metallographic microscope, and there are still many residues beside the electrode grid lines , these residues will produce light absorption and affect the photoelectric conversion efficiency of solar cells
On the other hand, some existing corrosive liquids are accompanied by lateral and lateral corrosion effects during longitudinal corrosion, which can affect the current expansion in mild cases, resulting in a significant increase in the internal resistance of the battery chip, and in severe cases, it can cause grid lines to fall off; and the corrosion process The window is small and difficult to control

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Etching solution for selectively etching gallium arsenide solar cell cap layer and preparation method thereof
  • Etching solution for selectively etching gallium arsenide solar cell cap layer and preparation method thereof
  • Etching solution for selectively etching gallium arsenide solar cell cap layer and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Embodiment 1. An etchant for selectively etching the cap layer of a gallium arsenide solar cell, 800 g of solid citric acid with a purity greater than 99.8%, 500 g of hydrogen peroxide with a mass concentration of 30%, and 35 g of a mixture of methylamine and ethylamine g, 25 g of a mixture of glycine and halosine, and 1000 g of deionized water are mixed and dissolved. After fully dissolving, adjust the pH to 8-10 with sodium hydroxide or potassium hydroxide solution to prepare a corrosion solution.

[0031] The specific operation steps are:

[0032] 1. First pour 800g of solid citric acid with a purity greater than 99.8% into the quartz cylinder;

[0033] 2. Add 1000 g deionized water to the quartz cylinder;

[0034] 3. Add 35 g of a mixture of methylamine and ethylamine and 25 g of a mixture of glycine and halosine into the quartz jar at the same time, stir with a glass rod and heat the quartz jar at the same time;

[0035] 4. After fully dissolving, add 500 g of hy...

Embodiment 2

[0037] Embodiment 2. An etching solution for selectively etching the cap layer of a gallium arsenide solar cell, using 1500 g of solid citric acid with a purity greater than 99.8%, 800 g of hydrogen peroxide with a mass concentration of 30%, and 180 g of a mixture of methylamine and ethylamine. g, 180 g of a mixture of glycine and halosine, and 1000 g of deionized water are mixed and dissolved. After fully dissolving, adjust the pH to 8-10 with sodium hydroxide or potassium hydroxide solution to prepare a corrosion solution.

[0038] The specific operation steps are:

[0039] 1. First pour 1500g of solid citric acid with a purity greater than 99.8% into the quartz cylinder;

[0040] 2. Add 1000 g deionized water to the quartz cylinder;

[0041] 3. Add 180 g of a mixture of methylamine and ethylamine and 180 g of a mixture of glycine and halosine into the quartz cylinder at the same time, stir with a glass rod and heat the quartz cylinder at the same time;

[0042] 4. After f...

Embodiment 3

[0044] Embodiment 3. An etching solution for selectively etching the cap layer of a gallium arsenide solar cell, 100 g of solid citric acid with a purity greater than 99.8%, 150 g of hydrogen peroxide with a mass concentration of 30%, and 15 g of a mixture of methylamine and ethylamine g, 15 g of a mixture of glycine and halosine, and 1000 g of deionized water are mixed and dissolved. After fully dissolving, adjust the pH to 8-10 with sodium hydroxide or potassium hydroxide solution to prepare a corrosion solution.

[0045] The specific operation steps are:

[0046] 1. First pour 100g of solid citric acid with a purity greater than 99.8% into the quartz cylinder;

[0047] 2. Add 1000 g deionized water to the quartz cylinder;

[0048] 3. Add 15 g of a mixture of methylamine and ethylamine and 15 g of a mixture of glycine and halosine into the quartz jar at the same time, stir with a glass rod and heat the quartz jar at the same time;

[0049] 4. After fully dissolving, add 15...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an etching solution for selectively etching a gallium arsenide solar cell cap layer, which is composed of the following components in parts by mass: 5-150 parts of component A, 10-100 parts of component B, 1-20 parts of component C, 1-20 parts of component D and 100 parts of component E. The component A is solid citric acid; the component B is oxydol; the component C is amine compounds; the component D is amino acid compounds; and the component E is deionized water. Preferably, the purity of the component A is greater than 99.8%, and the mass concentration of the component B is 30%. The invention also discloses a preparation method of the etching solution. The etching solution can well control the etching rate, has higher etching uniformity, and thoroughly removes the residues, thereby obtaining the cell gate line structure with smooth side bench.

Description

technical field [0001] The invention relates to a chemical etching solution used in solar cell production, in particular to an etching solution for selectively etching the cap layer of a gallium arsenide solar cell and a preparation method thereof. Background technique [0002] attached figure 1 The epitaxial structure diagram of a concentrating triple-junction gallium arsenide solar cell is shown, which is a GaInP top cell, a GaAs middle cell, and a Ge bottom cell connected in series, and the GaInP top cell absorbs photon energy greater than 1.85eV Sunlight, GaAs cells absorb sunlight with photon energy greater than 1.42eV, and Ge bottom cells absorb sunlight with photon energy greater than 0.67eV. The absorption band is 380-1850nm, covering almost all sunlight bands. The battery with the highest conversion efficiency among solar cells. [0003] In the manufacturing process of the concentrating triple-junction GaAs solar cell chip, after evaporating the electrode grid lin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09K13/00H01L31/18
CPCY02P70/50
Inventor 蔡建九吴洪清林志伟陈凯轩张永王向武
Owner XIAMEN CHANGELIGHT CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products