Laser-chemical preparation method of monocrystal silicon substrate sub-micron pyramid structure

Abstract

The invention discloses a laser-chemical preparation method of a monocrystal silicon substrate sub-micron pyramid structure, belonging to the field of crystalline silicon surface micro-structure preparation. The preparation method comprises the following steps: firstly, performing pretreatment on monocrystal silicon, and covering periodically close-packed microspheres on the surface of monocrystal silicon; performing irradiation by adopting a 248nm laser, wherein the single pulse energy density is 100-400mJ/cm<2>; performing certain treatment on a monocrystal silicon sample after irradiation, and removing the residual microspheres on the surface; after removal ends, dipping the monocrystal silicon sample into a sodium hydroxide aqueous solution containing ethanol under the environment that the water bath temperature is 70-80 DEG C, eroding for 10-30 seconds, taking out the monocrystal silicon sample, and washing by using deionized water to obtain a monocrystal silicon piece with a normal pyramid array. The laser-chemical preparation method disclosed by the invention exerts the laser controllability, can be used for rapidly and simply preparing the pyramid array with periodicity and uniformity, has high controllability in pyramid forming, can be used for adjusting the separation distance and morphology features of the pyramid array, also is low in raw material cost, and has relatively high practicability.

Description

technical field [0001] The invention belongs to the field of crystal silicon surface microstructure preparation. Background technique [0002] Effectively adjusting the surface microstructure of single crystal silicon is a focus in the field of semiconductor research. Periodically ordered pyramid arrays not only have special size and shape effects, but also have good optical, electrical, and magnetic properties. The conventional method of preparing pyramids is to use the anisotropic corrosion properties of alkaline solution to single crystal silicon, and to control the size and shape characteristics of the pyramids by adjusting the concentration of alkaline solution and the concentration of additives. The prepared pyramids are completely devoid of periodicity and uniformity. Moreover, in order to obtain a pyramid structure with a large coverage area, a certain period of alkaline etching is required. Feng Shimeng's group at Shanghai Jiao Tong University can control the etchi...

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Problems solved by technology

Although nanoimprinting can obtain higher graphics resolution, the thermal embossing method needs to be prepared under high temperature and high pressure, which has high requirements on the environment, and because its graphic accuracy is closely related to the precision of the mold, the resolution of the mold There are high requirements on rate, planarization, uniformity, surface energy, etc.

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