Surface discharge type glass substrate for light pumping source and preparation method of surface discharge type glass substrate for light pumping source

A surface discharge, glass substrate technology, applied in chemical instruments and methods, glass/slag layered products, circuits, etc., can solve the problem of short operating life of surface discharge optical pump sources, limitations of high-power repetition frequency XeF applications, alumina Poor thermal shock resistance and other problems, to achieve the effect of easy nucleation and growth, small residual thermal stress, and improved ablation resistance

Active Publication Date: 2015-03-04
NAT UNIV OF DEFENSE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the thermal shock resistance of alumina is poor, and there is a large temperature rise in a very short period of time during the surface discharge process, resulting in overall cracking of some alumina substrates after several or dozens of discharges
[0006] Currently, limited by the anti-ablation performance of the surface discharge substrate, the operating life of the surface discharge optical pump source is short, which limits the application of high-power repetition frequency XeF(C-A) blue-green lasers in the underwater laser field.

Method used

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  • Surface discharge type glass substrate for light pumping source and preparation method of surface discharge type glass substrate for light pumping source
  • Surface discharge type glass substrate for light pumping source and preparation method of surface discharge type glass substrate for light pumping source
  • Surface discharge type glass substrate for light pumping source and preparation method of surface discharge type glass substrate for light pumping source

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Embodiment 1

[0034] a kind of like figure 1 , figure 2 and image 3 The surface discharge glass substrate for the optical pumping source of the present invention is shown, the surface discharge glass substrate is a double-layer stacked structure, including a quartz glass body 2 and a diamond ablation-resistant coating 1 deposited on the quartz glass body 2 ( diamond continuous film). In this embodiment, the thickness of the diamond ablation-resistant coating 1 is 140.0 μm, and the surface resistance is 1.0×10 13 Ω·cm.

[0035] The preparation method of surface discharge glass substrate in the present embodiment comprises the following steps:

[0036] (1) select the diamond powder that particle diameter is 5.0 μ m for use, with dehydrated alcohol, diamond powder, magnesium carbonate by mass ratio be 85: 14: 1 and fully mix, promptly prepare diamond suspension;

[0037] (2) First use 80-mesh SiC water-grinding paper to polish a quartz glass body for 5.0min, then use the above-mentioned...

Embodiment 2

[0042] a kind of like image 3 The surface discharge glass substrate for the optical pumping source of the present invention is shown, the surface discharge glass substrate is a double-layer stacked structure, including a quartz glass body 2 and a diamond ablation-resistant coating 1 deposited on the quartz glass body 2 ( diamond continuous film). In this embodiment, the thickness of the diamond ablation-resistant coating 1 is 180.0 μm, and the surface resistance is 4.0×10 13 Ω·cm.

[0043] The preparation method of surface discharge glass substrate in the present embodiment comprises the following steps:

[0044] (1) select the diamond powder that particle diameter is 1.0 μm for use, acetone, diamond powder, magnesium carbonate are fully mixed evenly by mass ratio as 80: 22: 2, promptly prepare diamond suspension;

[0045] (2) Use 80-mesh SiC water-grinding paper to polish a quartz glass body for 5.0 minutes, then use the above-mentioned suspension on 400-mesh SiC water-gr...

Embodiment 3

[0050] a kind of like image 3 The surface discharge glass substrate for the optical pumping source of the present invention is shown, the surface discharge glass substrate is a double-layer stacked structure, including a quartz glass body 2 and a diamond ablation-resistant coating 1 deposited on the quartz glass body 2 ( diamond continuous film). In this embodiment, the thickness of the diamond ablation-resistant coating 1 is 200.0 μm, and the surface resistance is 9.9×10 13 Ω·cm.

[0051] The preparation method of surface discharge glass substrate in the present embodiment comprises the following steps:

[0052] (1) select the diamond powder that particle diameter is 4.0 μ m for use, xylene, diamond powder, magnesium carbonate are fully mixed evenly by mass ratio as 80: 19: 1, promptly prepare diamond suspension;

[0053] (2) First use 80-mesh SiC water-grinding paper to polish a quartz glass body for 5.0min, then use the above-mentioned suspension on 400-mesh SiC water-g...

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Abstract

The invention discloses a surface discharge type glass substrate for a light pumping source. The surface discharge glass substrate comprises a quartz glass body and a diamond ablation-resisting coating deposited on the quartz glass body, wherein the diamond ablation-resisting coating is only deposited on the surface of the quartz glass body, so that a surface discharge region is generated. The preparation method provided by the invention comprises the following steps: preparing a diamond-powder-containing turbid liquid; grinding the surface of the quartz glass body by using the turbid liquid, and then performing ultrasonic oscillating pretreatment; shielding a region, in which surface discharge is not generated, on the quartz glass body; and forming the diamond ablation-resisting coating on the surface of the quartz glass body by performing hot filament chemical vapor deposition to obtain the surface discharge type glass substrate. The surface discharge type glass substrate provided by the invention has the advantages of plasma ablation resistance, high reusing time, low cost and the like.

Description

technical field [0001] The invention belongs to the technical field of functional materials and their preparation, and in particular relates to a surface discharge glass substrate and a preparation method thereof. Background technique [0002] The XeF (C-A) laser band coincides with the best window for atmospheric and underwater transmission, and has low attenuation. It has potential application prospects in the fields of airborne marine lidar and underwater communication. XeF(C-A) laser can be divided into three types according to the way of generating pump light (140nm~170nm): (1) electron beam pumping Xe gas to generate fluorescence near 172nm; (2) plasma broadband generated by explosive filament fusing Strong vacuum ultraviolet light radiation; (3) plasma broadband strong vacuum ultraviolet light radiation generated by surface discharge. The fluorescence wavelength generated by electron beam pumping Xe gas is 172nm, which is in the photolysis of XeF 2 The edge of the w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B17/06B32B33/00C03C17/22
CPCC03C17/22H01S3/091
Inventor 李俊生魏秋平黄超程海峰周永江罗浩童思超
Owner NAT UNIV OF DEFENSE TECH
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