Surface discharge ceramic substrate for optical pumping source and preparation method thereof

A technology of surface discharge and ceramic substrate, which is applied in the field of functional materials and its preparation, can solve the problem that the anti-ablation performance cannot meet the requirements of substrate anti-discharge plasma ablation, the operating life of the surface photodischarge optical pump source is short, and the limitation of high power Repeated frequency XeF application and other issues to achieve the effect of easy nucleation and growth, optimization of process conditions and parameters, and small residual thermal stress

Active Publication Date: 2017-05-03
NAT UNIV OF DEFENSE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The anti-ablation performance of a pure ceramic substrate still cannot meet the requirements of the substrate for anti-discharge plasma ablation, and it is also difficult to meet the aforementioned harsh operating environment requirements.
[0005] Currently, limited by the anti-ablation performance of the surface discharge substrate, the operating life of the surface discharge optical pump source is short, which limits the application of high-power repetition frequency XeF(C-A) blue-green lasers in the underwater laser field.

Method used

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  • Surface discharge ceramic substrate for optical pumping source and preparation method thereof
  • Surface discharge ceramic substrate for optical pumping source and preparation method thereof
  • Surface discharge ceramic substrate for optical pumping source and preparation method thereof

Examples

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Embodiment 1

[0037] a kind of like figure 1 , figure 2 and Figure 4 The alumina surface discharge ceramic substrate used for the optical pumping source of the present invention is shown, and the surface discharge ceramic substrate is a double-layer stacked structure, including an alumina ceramic body 2 (wherein α-Al 2 o 3 The content is 95%) and the diamond ablation-resistant coating 1 (diamond continuous film) deposited on the alumina ceramic body 2. In this embodiment, the thickness of the diamond ablation-resistant coating 1 is 40.0 μm, and the surface resistance is 1.5×10 12 Ω·cm.

[0038] The preparation method of the surface discharge ceramic substrate in this embodiment comprises the following steps:

[0039] (1) select the coarse-grained diamond powder that particle diameter is 4.0 μ m for use, the fine-grained diamond powder that particle diameter is 0.8 μ m, acetone, coarse-grained diamond powder, fine-grained diamond powder, magnesium carbonate are 75% by mass ratio : 10...

Embodiment 2

[0045] a kind of like image 3 , Figure 4 The surface discharge ceramic substrate of beryllium oxide used for optical pumping source of the present invention is shown, the surface discharge ceramic substrate is a double-layer stacked structure, including a beryllium oxide ceramic body 2 and ablation-resistant diamond deposited on the beryllium oxide ceramic body 2 Coating 1 (diamond continuous film). In this embodiment, the thickness of the diamond ablation-resistant coating 1 is 80.0 μm, and the surface resistance is 7.2×10 12 Ω·cm.

[0046] The preparation method of the surface discharge ceramic substrate in this embodiment comprises the following steps:

[0047] (1) select the coarse-grained diamond powder that particle diameter is 1.0 μ m for use, the fine-grained diamond powder that particle diameter is 0.1 μ m, acetone, coarse-grained diamond powder, fine-grained diamond powder, magnesium carbonate are 85 by mass ratio : 6: 12: 2 are fully mixed and evenly prepared ...

Embodiment 3

[0053] a kind of like Figure 4 The alumina surface discharge ceramic substrate used for the optical pumping source of the present invention is shown, and the surface discharge ceramic substrate is a double-layer stacked structure, including an alumina ceramic body 2 (wherein α-Al 2 o 3 The content is 99%) and the diamond ablation-resistant coating 1 (diamond continuous film) deposited on the alumina ceramic body 2. In this embodiment, the thickness of the diamond ablation-resistant coating 1 is 100.0 μm, and the surface resistance is 9.0×10 12 Ω·cm.

[0054] The preparation method of the surface discharge ceramic substrate in this embodiment comprises the following steps:

[0055] (1) select particle diameter to be the coarse-grained diamond powder of 5.0 μ m, the fine-grained diamond powder of 0.6 μ m in particle diameter, acetone, coarse-grained diamond powder, fine-grained diamond powder, magnesium carbonate are 80% by mass ratio : 5: 14: 1 and fully mixed to obtain di...

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Abstract

The invention discloses a surface-discharge ceramic substrate applied to an optical pumping source. The surface-discharge ceramic substrate comprises a ceramic body and a diamond ablation-resistant coating deposited on the ceramic body, wherein the diamond ablation-resistant coating is deposited in only a region where surface discharge is generated on the surface of the ceramic body. The manufacturing method of the surface-discharge ceramic substrate comprises the following steps: preparing turbid liquid containing diamond powder; pretreating the ceramic body by using a hydrofluoric acid solution and then planting seed crystals for the ceramic body by using the turbid liquid; shielding the region, where no surface discharge is generated, of the ceramic body; depositing the diamond ablation-resistant coating on the surface of the ceramic body by means of hot filament chemical vapor deposition to obtain the surface-discharge ceramic substrate. The surface-discharge ceramic substrate disclosed by the invention is good in plasma ablation resistance, high in reutilization frequency and low in cost.

Description

technical field [0001] The invention belongs to the technical field of functional materials and their preparation, and in particular relates to a surface discharge substrate for an optical pumping source and a preparation method thereof. Background technique [0002] The XeF(C-A) laser band coincides with the best window for atmospheric and underwater transmission, and has low attenuation, so it has potential application prospects in underwater communication and other fields. XeF(C-A) laser can be divided into three types according to the way of generating pump light (140nm~170nm): (1) electron beam pumping Xe gas to generate fluorescence near 172nm; (2) plasma broadband generated by explosive filament fusing Strong vacuum ultraviolet light radiation; (3) plasma broadband strong vacuum ultraviolet light radiation generated by surface discharge. The fluorescence wavelength generated by electron beam pumping Xe gas is 172nm, which is in the photolysis of XeF 2 The edge of th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C04B41/85
Inventor 李俊生魏秋平黄超程海峰周永江罗浩童思超
Owner NAT UNIV OF DEFENSE TECH
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