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Method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner

A technology of nano-titanium dioxide and titanium dioxide, which is applied in the field of chemical technology and new material synthesis, can solve problems such as complex process and equipment corrosion, and achieve the effects of short process flow, improved performance, and continuous and stable operation

Inactive Publication Date: 2015-03-11
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The present invention is a method for preparing nano-titanium dioxide microcrystals with solid-state feeding, and its purpose is to overcome defects such as complex process and equipment corrosion in the above-mentioned prior art, and discloses A technical solution for preparing high-purity nano-titanium dioxide microcrystalline materials with uniform particle size distribution by means of solid-state feeding and plasma vapor deposition

Method used

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  • Method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner
  • Method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner
  • Method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner

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Embodiment approach 1

[0028]Titanium dioxide powder with an average particle size of 1.0 μm is used as raw material. Add 20g of titanium dioxide powder raw material to the solid feeder 6; the power of the high-frequency plasma generator 1 is 2.5KW; the inner diameter of the high-frequency plasma reactor 2 is 20mm, and the ratio of the length to the inner diameter is 4:1; the cooler 3 The inner diameter of the tube is 75mm, and the ratio of the length to the inner diameter is 4:1; the glass fiber in the product collector 4 is 150 mesh, and the power of the induced draft fan 5 is 200W. The cooling water flow rates of the high-frequency plasma reactor 2 and the cooler 3 are 20 l / h and 100 l / h respectively; with argon as the plasma working gas, the volume flow rates of gas and cooling gas at inlets c and d are respectively 3 l / min and 10 l / min; the air inlet a is located at 1 / 2 of the axial direction of the high-frequency plasma reactor 2, with a diameter of 0.5mm; the volume flow rate of oxygen at the...

Embodiment approach 2

[0030] Titanium dioxide powder with an average particle size of 1.0 μm is used as raw material. Add 30g of titanium dioxide powder raw material to the solid feeder 6; the power of the high-frequency plasma generator 1 is 3.0KW; the inner diameter of the high-frequency plasma reactor 2 is 25mm, and the ratio of the length to the inner diameter is 4:1; the cooler 3 The inner diameter of the tube is 150mm, and the ratio of the length to the inner diameter is 5:1; the glass fiber in the product collector 4 is 100 mesh, and the power of the induced draft fan 5 is 280W. The cooling water flows of the high-frequency plasma reactor 2 and the cooler 3 are 25 l / h and 150 l / h respectively; with argon as the plasma working gas, the volume flow rates of gas and cooling gas at inlets c and d are respectively 5 l / min and 15 l / min; the air inlet a is located at 1 / 2 of the axial direction of the high-frequency plasma reactor 2, with a diameter of 0.5 mm; the volume flow rate of oxygen in the a...

Embodiment approach 3

[0032] Titanium dioxide powder with an average particle size of 10 μm is used as raw material. Add 150g of titanium dioxide powder raw material to the solid feeder 6; the power of the high-frequency plasma generator 1 is 10KW; the inner diameter of the high-frequency plasma reactor 2 is 40mm, and the ratio of the length to the inner diameter is 5:1; The inner diameter is 150mm, and the ratio of the length to the inner diameter is 6:1; the glass fiber in the product collector 4 is 100 mesh, and the power of the induced draft fan 5 is 1000W. The cooling water flow rates of high frequency plasma reactor 2 and cooler 3 are 75 l / h and 500 l / h respectively; the mixture of argon and oxygen is used as the plasma working gas, the ratio of argon and oxygen is 5:1, gas and The volume flow rate of the cooling gas at the inlet c and d is 20 l / min and 60 l / min respectively; the inlet a is located at 2 / 3 of the axial direction of the high-frequency plasma reactor 2, and the diameter is 1...

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Abstract

The invention discloses a method for preparing nanometer titanium dioxide microcrystalline by utilizing solid state feeding manner, belongs to the technical field of chemical technology and novel material synthesis, and relates to a production technology for preparing the nanometer titanium dioxide microcrystalline by adopting a high-frequency plasma vapor deposition method. The method disclosed by the invention comprises the following steps: adopting solid state titanium dioxide powder as a basic material, completing decomposition and an oxidation reaction under an oxygen-rich high-frequency plasma state jet flow atmosphere, and carrying out shock cooling to obtain the nanometer titanium dioxide microcrystalline with an average grain diameter range of 20-50 nm. Compared with the other methods, the microcrystalline prepared by the method is high in purity and approximately spherical; the particle size of the microcrystalline can be controlled; the method is short in technological process, and continuous in operation, and facilitates industrial production.

Description

technical field [0001] The invention discloses a method for preparing solid-state feed nano-titanium dioxide microcrystals, which belongs to the technical field of chemical technology and new material synthesis. It specifically relates to a method for preparing a nano titanium dioxide microcrystalline material by entering solid titanium dioxide powder into an oxygen-rich high-frequency plasma jet atmosphere, and through a high-frequency plasma vapor deposition method. Background technique [0002] There are three isotropes of solid TiO2: Anatase, Rutile and Brookite. The common ones in nature are rutile and anatase, whose structure can be described by Ti-O octahedron, belonging to the Tetragonal system. As a classic N-type semiconductor material, nano-TiO2 is widely used in catalysts and their carriers, ceramic plasticizers, PTC components, sensors, ultraviolet absorbers and high-grade coatings. For example, in 1987, Ford of the United States first used nano-TiO2 in the me...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G23/047B82Y30/00
CPCC01G23/047C01P2002/72C01P2004/03C01P2004/04C01P2004/51C01P2004/64
Inventor 王俊文樊林峰赵燕凌张侃刘世斌谢鲜梅
Owner TAIYUAN UNIV OF TECH
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