Fabrication process of surface plasmon coupled nanoarrays based on scallop effect
A surface plasmon and nanoarray technology, which is applied in the field of ion-plasmon coupled nanoarrays, can solve the problems of poor controllability and limited practicability, and achieves the effect of optimizing the design of the coupling structure and facilitating process integration.
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[0022] The present invention will be described in detail below in conjunction with the accompanying drawings and examples.
[0023] The present invention utilizes deep reactive ion etching of traditional microelectronics technology (formation of scallop topography sidewall by alternating etching and passivation——Scallop effect) and electron beam exposure (for making photolithography mask with nanoscale precision) technology , proposed a three-dimensional nano-optical structure processing technology combining electron beam exposure and deep reactive ion etching, and prepared functional units of "metallized nanostructure-spacer layer-metal film" and their periodic arrangement of "LSP-SPP coupling "Nanoarrays.
[0024] The principle of the "LSP-SPP coupling" nano-array processing technology of the present invention is as follows:
[0025] Such as Figure 1-7 As shown, an etch mask layer 2 is deposited on a substrate 1 (such as a silicon wafer) such as figure 1 , spin-coated e-...
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