Texturing preprocessing solution and method of diamond wire cutting polycrystalline silicon wafer, texturing preprocessing silicon wafer and application of texturing preprocessing silicon wafer
A technology of diamond wire cutting and polysilicon wafers, applied in post-processing, post-processing details, chemical instruments and methods, etc., can solve the problems of dense traces on the surface, shallow damage layer on the surface of silicon wafers, etc., and achieve simple proportioning and processing Short-term, highly operable effects
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[0058] A kind of texturing pretreatment method of diamond wire cut polysilicon chip, comprises the steps:
[0059] (1) Preparation of velvet pretreatment liquid:
[0060] Mixing nitric acid, hydrofluoric acid, acetic acid and water to obtain a texturing pretreatment solution, wherein the volume ratio of nitric acid, hydrofluoric acid, acetic acid and water is 10-15:1-5:2-6:10-30;
[0061] (2) Preparation of porous silicon structure:
[0062] Take the diamond wire-cut polycrystalline silicon wafer and clean it with a concentration of 10% dilute HF solution to remove the oil stain and oxide layer on the surface of the silicon wafer, and then place it in the texturing pretreatment solution for pretreatment. The treatment temperature is At room temperature, the treatment time is 5 minutes to obtain a polysilicon wafer with a porous structure, that is, a pretreated polysilicon wafer for texturing.
[0063] Get the textured pretreated polysilicon wafer obtained by the above pretre...
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