Transparent organic light-emitting device and method for manufacturing same
A luminescence and electromechanical technology, applied in the direction of electrical solid devices, semiconductor/solid device manufacturing, electrical components, etc., can solve the problems of low light transmittance, easy cracks, thick transparent devices, etc., and achieve good compactness and uniformity , low deposition temperature and strong adhesion
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Embodiment 1
[0058] figure 1 It is a schematic structural view of the transparent organic electroluminescent device in Example 1; as figure 1As shown, the transparent organic electroluminescent device in Example 1 includes an ITO glass substrate (10), an organic light-emitting functional layer (20), a transparent cathode (30) and an encapsulation layer (40) stacked sequentially from bottom to top; The organic electroluminescent functional layer (20) includes a hole injection layer (21), a hole transport layer (22), a light emitting layer (23), an electron transport layer (24) and an electron injection layer ( 25). figure 2 yes figure 1 Schematic diagram of the structure of the encapsulation layer of the transparent organic electroluminescent device; as figure 2 As shown, the encapsulation layer (40) includes a mixed barrier layer (41), a first silicon oxynitride film layer (42), an inorganic barrier layer (43) and a second oxygen Silicon nitride film layer (44).
[0059] A method fo...
Embodiment 2
[0077] A method for preparing a transparent organic electroluminescent device, comprising the steps of:
[0078] (1), (2), (3) are the same as embodiment 1;
[0079] (4) Preparation of encapsulation layer:
[0080] a) Preparation of the mixed barrier layer: the mixed barrier layer was prepared on the surface of the transparent cathode by vacuum evaporation method, and the vacuum degree was 1×10 -5 Pa, the evaporation rate is The mixed barrier layer materials include N,N'-diphenyl-N,N'-di(1-naphthyl)-1,1'-biphenyl-4,4'-diamine (NPB) and doped in Aluminum fluoride (AlF 3 ) and neodymium fluoride (NdF 3 ); aluminum fluoride (AlF 3 ) The mass fraction is 20%, neodymium fluoride (NdF 3 ) is 10% by mass; the thickness of the mixed barrier layer is 200nm;
[0081] b) Preparation of the first silicon oxynitride film layer: the first silicon oxynitride film layer was prepared on the surface of the mixed barrier layer by plasma enhanced chemical vapor deposition, the working pre...
Embodiment 3
[0086] A method for preparing a transparent organic electroluminescent device, comprising the steps of:
[0087] (1), (2), (3) are the same as embodiment 1;
[0088] (4) Preparation of encapsulation layer:
[0089] a) Preparation of the mixed barrier layer: the mixed barrier layer was prepared on the surface of the transparent cathode by vacuum evaporation method, and the vacuum degree was 1×10 -5 Pa, the evaporation rate is Hybrid barrier materials include 8-hydroxyquinoline aluminum (Alq 3 ) and doped in 8-hydroxyquinoline aluminum (Alq 3 ) in magnesium fluoride (MgF 2 ) and gadolinium fluoride (GdF); magnesium fluoride (MgF 2 ) is 10% by mass, and gadolinium fluoride (GdF) is 20% by mass; the thickness of the mixed barrier layer is 100nm;
[0090] b) Preparation of the first silicon oxynitride film layer: the first silicon oxynitride film layer was prepared on the surface of the mixed barrier layer by plasma enhanced chemical vapor deposition, the working pressure wa...
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