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Large-aperture diffraction grating exposure device and preparation method of large-aperture diffraction grating

A diffraction grating and exposure device technology, which is applied in the field of diffraction grating, can solve the problems of sensitivity to environmental changes, longer exposure time, and difficulty in increasing power, and achieve the effects of simple system, easy large-diameter parabolic mirror, and improved imaging quality

Active Publication Date: 2017-03-15
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] Another problem is: when the aperture of a single exposure is increased, the exposure time will become longer and more sensitive to environmental changes
Commonly used gas lasers (such as argon ion lasers, krypton ion lasers and their mixed gas lasers, etc.), its power is difficult to increase

Method used

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  • Large-aperture diffraction grating exposure device and preparation method of large-aperture diffraction grating
  • Large-aperture diffraction grating exposure device and preparation method of large-aperture diffraction grating
  • Large-aperture diffraction grating exposure device and preparation method of large-aperture diffraction grating

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Embodiment 1

[0037] see figure 1, The exposure device of the large-aperture holographic grating of the present invention consists of a laser 1, an electronic shutter 2, a first half-wave plate 3, a polarizing beam splitter 4, a second half-wave plate 5, a first mirror 6, a second mirror 7, the first A spatial filter 8, a first rectangular aperture 9, a first large off-axis parabolic reflector 10, a piezoelectric ceramic 11, a third reflector 12, a second spatial filter 13, a second rectangular aperture 14, a second It consists of a large off-axis parabolic reflector 15, a substrate 16, a small reference grating 17, a receiving screen 18, a CCD 19 and a computer 20. The positional relationship of the above components is as follows:

[0038] The vertically polarized laser light emitted by the laser 1 passes through the electronic shutter 2 and the first half-wave plate 3 and is divided into two left and right beams by the polarizing beam splitter 4, and the left beam passes through the first...

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Abstract

The invention discloses a large-diameter diffraction grating exposure device for manufacturing a large-diameter diffraction grating on a substrate coated with photoresist, and a manufacture method of the large-diameter diffraction grating. The device is composed of a laser, an electronic shutter, a first half-wave plate, a polarization beam splitter, a second half-wave plate, a first mirror, a second mirror, a first spatial filter, a first rectangular aperture, a first large off-axis parabolic mirror, a piezoelectric ceramic, a third mirror, a second spatial filter, a second rectangular aperture, a second large off-axis parabolic mirror, the substrate, a small reference grating, an accepting screen, a CCD (Charge Coupled Device) and a computer. According to the invention, a single-frequency frequency stabilized semiconductor laser or a laser diode pumped solid-state laser, which can provide high continuous power or average power, is adopted, as a result, exposure time is reduced greatly, requirement of system on environmental stability is lowered, and the substrate can be made of a light material or a material with small expansion coefficient, thus, the device has the advantages that imaging quality is high, no aberration is generated, diameter of the manufactured diffraction grating is large, and the device is convenient to use and cheap.

Description

technical field [0001] The invention relates to a diffraction grating, in particular to an exposure device for a large-diameter diffraction grating and a preparation method for the large-diameter diffraction grating. Background technique [0002] Large-aperture equidistant one-dimensional diffraction gratings are one of the key elements in many large-scale scientific devices, such as pulse compression gratings used in laser inertial confinement fusion systems. Laser inertial confinement fusion is one of the main methods to achieve controllable nuclear fusion to obtain huge energy inside the nucleus. In the laser inertial confinement fusion system, two pulse compression gratings use their dispersion function to compress the pulse laser that has been broadened and amplified in power, thereby increasing the peak power of the laser. Therefore, the pulse compression grating needs to carry a strong laser. The larger the caliber, the lower the energy per unit area. Under a fixed d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B5/18
Inventor 徐文东阮昊苏雅茹
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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