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Acne-removing scar-lightening mask solution, manufacturing method and acne-removing scar-lightening mask

A facial mask liquid and a technology for removing acne, which can be used in the field of acne and acne scar removal facial mask, acne scar removal facial mask liquid and its manufacture, and the field of facial mask liquid and its manufacture. Red blood symptoms, increased cell thickness, easy transdermal absorption effect

Inactive Publication Date: 2015-08-05
朱敏
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these facial masks are not good enough in the effect of removing acne and lightening acne marks. Therefore, it is urgent to develop a facial mask with a significant effect of removing acne and reducing acne marks.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] A facial mask liquid for removing acne marks, which is made of the following components by weight percentage: sodium hyaluronate (molecular weight: 9500Da): 0.16%, EDTA-2Na: 0.05%, transparent xanthan gum: 0.34%, gold Hazel Extract: 18%, Yeast Glucan: 0.8%, Dipotassium Glycyrrhizinate: 2%, 1,3-Butanediol: 8%, NB320: 6%, Methylparaben: 0.2%, Mung Bean Extract Substances: 1.5%, EGF-1: 3.5%, deionized water: the rest.

[0031] According to above-mentioned components and percentage by weight, the manufacture step of described mask liquid comprises:

[0032] a. Stir the sodium hyaluronate, EDTA-2Na, transparent xanthan gum, dipotassium glycyrrhizinate, 1,3-butanediol and deionized water at 83°C for 45min at a speed of 3500rpm to each group mix evenly;

[0033] b. Cool the component mixture in step a to 46°C, add witch hazel extract, yeast dextran, NB320, methylparaben, EGF-1 and mung bean extract, and stir at 3000rpm for 45min After all the components are mixed evenly, th...

Embodiment 2

[0035] A facial mask liquid for removing acne marks, which is made of the following components by weight percentage: sodium hyaluronate (molecular weight: 1500kDa): 0.28%, EDTA-2Na: 0.15%, AVC thickener: 0.03%, propylene Ammonium Acyldimethyltaurate / Beheneth-25 Methacrylate Crosspolymer: 0.4%, Witch Hazel Extract: 6%, Sclerotinia: 0.02%, Mushroom Glucan: 0.05%, Tetrandrine: 0.03%, Chamomile Flower Extract: 0.05%, Glycerol: 2%, PEG-400: 3%, FC170: 2%, Methylparaben: 0.1%, Ethylparaben: 0.2%, mung bean extract: 0.3%, AFGF: 0.05%, deionized water: the balance.

[0036] According to above-mentioned components and percentage by weight, the manufacture step of described mask liquid comprises:

[0037] a. Sodium hyaluronate, EDTA-2Na, AVC thickener, ammonium acryloyldimethyl taurate / beheneth-25 methacrylate crosslinked polymer, tetrandrine , chamomile flower extract, glycerol, PEG-400 and deionized water were stirred at 85°C at a speed of 3200rpm for 40min until all components were m...

Embodiment 3

[0040] A facial mask liquid for removing acne marks, which is made of the following components by weight percentage: seaweed polysaccharide: 0.05%, aloe polysaccharide: 0.8%, EDTA-2Na: 0.01%, SEPINOV TM EMT-10: 0.02%, Carrageenan: 0.03%, Witch Hazel Extract: 22%, Oat Glucan: 0.03%, Yeast Glucan: 0.5%, Dipotassium Glycyrrhizinate: 3%, Chamomile Extract: 1.5%, 1,5-pentanediol: 2%, glycerol: 1%, NB320: 3.5%, ethylhexylglycerin: 0.1%, phenoxyethanol: 0.1%, mung bean extract: 4%, EGF- 1: 0.8%, EGF-5: 0.7%, deionized water: the rest.

[0041] Its manufacture process is with embodiment 1.

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Abstract

The invention discloses an acne-removing scar-lightening mask solution which is prepared from the following components in percentage by weight: 0.01-1% of high-molecular humectant, 0.01-0.2% of disodium edetate, 0.01-0.5% of thickener, 5-25% of witch hazel extract, 0.01-2.0% of conditioner, 0.01-5% of desensitizer, 1-10% of low-molecular humectant, 1-8% of plant acne-removing agent, 0.1-0.5% of preservative, 0.01-0.5% of mung bean extract, 0.01-5% of epidermal growth factor and the balance of deionized water. The manufacturing method of the acne-removing scar-lightening mask solution is simple. Under the synergistic actions of the plant acne-removing agent and mung bean extract in combination with the epidermal growth factor and witch hazel extract, the mask solution has the quick effects of acne removal, itching relief and sterilization, and can restore the damaged skin and lighten the acne marks and scars while removing the acnes, thereby improving the skin from inside to outside and restoring the smooth, delicate and healthy skin.

Description

technical field [0001] The invention relates to a facial mask liquid and a manufacturing method thereof, in particular to an acne-removing facial mask liquid containing mung bean extract and a manufacturing method thereof. In addition, the invention also relates to an acne-removing and blemish-reducing facial mask containing the facial mask liquid, which belongs to the field of cosmetics. Background technique [0002] As a common skin care product in daily life, mask uses the short time covered on the face to promote the expansion of skin pores, promote the secretion and metabolism of sweat glands, increase the oxygen content of the skin, and promote the metabolism of epidermal cells in the skin. The products and accumulated oils and fats, and make the highly concentrated nutrients in the mask liquid quickly replenish into the skin, so as to realize the rapid and effective care of the skin. At present, there are many kinds of facial masks on the market, and the efficacy of ...

Claims

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Application Information

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IPC IPC(8): A61K8/99A61K8/97A61K8/73A61K8/65A61K8/64A61K8/63A61Q19/00A61Q19/02A61P17/10
Inventor 朱敏
Owner 朱敏
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