Nickel waste water treatment method for chip production line

A treatment method and production line technology, applied in heating water/sewage treatment and other directions, can solve problems such as affecting the economic benefits of chip processing enterprises, unfavorable chip sustainable development, complex treatment steps, etc., to promote sustainable development and equipment maintenance costs. Low, high throughput effect

Active Publication Date: 2016-02-03
四川上特科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The existing method needs to fully break the complexation treatment to release nickel ions, so a large amount of chemical reagents are needed, the processing steps are complicated, and the cost is high, which affects the economic benefits of chip processing enterprises and is not conducive to the sustainable development of the chip industry. develop

Method used

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  • Nickel waste water treatment method for chip production line

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Effect test

Embodiment 1

[0030] A method for treating nickel waste water in a chip production line, comprising waste water collection, waste water evaporation, waste gas treatment and solid waste residue treatment; the waste water evaporation is to enter high-temperature gas into the evaporation chamber 2 for heating and evaporation, the evaporation time is 12 hours, and the evaporation temperature is 220°C.

[0031] The waste gas in the waste gas treatment step in this embodiment is treated with a BFT acid mist purification tower. The BFT acid mist purification tower is a treatment tower with a packing type gas-liquid mass transfer circular structure. The packing layer is: two to five layers Polypropylene multifaceted hollow balls with a diameter of 50mm and toothed packing, the treatment process is to draw the exhaust gas into the tower through the fan, and wash it with sodium hydroxide with a concentration of 5-10%. After the washing liquid is purified by the purification tower, To meet the dischar...

Embodiment 2

[0034] A method for treating nickel waste water in a chip production line, comprising waste water collection, waste water evaporation, waste gas treatment and solid waste residue treatment; the waste water evaporation is to enter high-temperature gas into the evaporation chamber 2 for heating and evaporation, the evaporation time is 16 hours, and the evaporation temperature is 180°C, the container of the evaporation chamber in this embodiment is made of stainless steel, and the specification is 100cm*200cm*100cm.

[0035] The high-temperature gas in this embodiment is the high-temperature exhaust gas generated in the chip production workshop, and the specific source is: exhaust gas generated in processes such as wafer diffusion, wafer oxidation, chip chemical vapor deposition, and chip passivation.

[0036] The flow rate of the high-temperature gas in this embodiment is 200 L / min.

[0037] The wastewater collection in this embodiment refers to collecting nickel wastewater from...

Embodiment 3

[0040] A method for treating nickel waste water in a chip production line, comprising waste water collection, waste water evaporation, waste gas treatment and solid waste residue treatment; the waste water evaporation is to enter high-temperature gas into the evaporation chamber 2 for heating and evaporation, the evaporation time is 14 hours, and the evaporation temperature is 200°C.

[0041] The high-temperature gas in this embodiment is the high-temperature waste gas generated in the chip production workshop.

[0042] The flow rate of the high-temperature gas in this embodiment is 300 L / min.

[0043]The wastewater collection in this embodiment refers to collecting nickel wastewater from the production line into the wastewater collection pool 1, and the wastewater collection pool 1 transports the wastewater to the evaporation chamber 2 through the wastewater supply pipeline 3; specifically, the evaporation chamber 2 is located in the waste water Above the collection pool 1, ...

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Abstract

The invention discloses a nickel waste water treatment method for a chip production line, belonging to the technical field of chip production waste water treatment. The waste water treatment method comprises waste water collection, waste water evaporation, waste gas treatment and solid waste slag treatment; the waste water evaporation is that high-temperature gas is led into an evaporation chamber for heating evaporation, wherein the evaporation time is 12 to 16h, and the evaporation temperature is 180 to 220 DEG C. After waste water is separated by a physical evaporation method, products are treated respectively, and the advantages of simple method, high treatment effect, no use of chemical reagents and environmental friendliness are achieved.

Description

technical field [0001] The invention relates to a wastewater treatment method, in particular to a nickel wastewater treatment method for a chip production line, and belongs to the technical field of chip production wastewater treatment. Background technique [0002] The chip production process is complicated, including silicon wafer cleaning, photolithography, etching, nickel plating, etc. A large number of chemical reagents such as hydrofluoric acid, ammonia water, nickel chloride, etc. are used in the process, and the wastewater includes nitrogen-containing wastewater and fluorine-containing wastewater , acid-base wastewater, organic wastewater, waste gas washing wastewater, nickel wastewater, etc. Among them, after nickel wastewater is discharged, it will deposit in the soil, and then be absorbed by plants and transferred to the human body. The plants with the highest nickel content are green vegetables And tobacco, up to 1.5 ~ 3ppm, the critical concentration of nickel t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/04
Inventor 李健儿李朝晖冯艾诚胡仲波陈华明冯永
Owner 四川上特科技有限公司
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