Method and product for improving microchannel plate soft X-ray-extreme ultraviolet ray imaging performance

A micro-channel plate, extreme ultraviolet technology, applied in cold cathode manufacturing, electrode system manufacturing, discharge tube/lamp manufacturing, etc., can solve problems such as low reflectivity of soft X-rays, achieve high repeatability, uniform thickness, The effect of enhancing feasibility

Inactive Publication Date: 2016-02-24
ZHEJIANG UNIV
View PDF3 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] The invention provides a method for improving the imaging performance of square-hole microchannel plates in the soft X-ray and extreme ultraviolet bands by using atomic layer deposition technology, so as to solve the problems of channel inner wall defec

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and product for improving microchannel plate soft X-ray-extreme ultraviolet ray imaging performance
  • Method and product for improving microchannel plate soft X-ray-extreme ultraviolet ray imaging performance
  • Method and product for improving microchannel plate soft X-ray-extreme ultraviolet ray imaging performance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] Relevant technical content of the present invention and explanation, cooperate accompanying drawing to set forth as follows now:

[0039] The atomic layer deposition equipment used in the present invention is TFS-200 provided by Beneq Company of Finland.

[0040] In order to enhance the adsorption of iridium film without affecting the reflection characteristics of iridium to X-rays, first coat an aluminum oxide film with a thickness of about 10nm:

[0041] The first step: the microchannel plate made of lead-bismuth glass is used as the substrate, and the structure is as follows figure 1 As shown, after the fixture is fixed, it is put into the reaction chamber, and the reaction chamber is evacuated to a vacuum state. Due to equipment problems, the reaction chamber can only reach a low vacuum environment, and the vacuum degree is about 6mbar;

[0042] The second step: according to the process requirements of alumina film growth, the temperature of the reaction chamber i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method and product for improving microchannel plate soft X-ray-extreme ultraviolet ray imaging performance. The method includes the steps that gaseous aluminium trimethide serves as an aluminum source, gaseous deionized water servers as an oxygen source, high-purity nitrogen serves as carrier gas and cleaning gas, an atom layer deposition system is utilized, and an aluminum oxide film is deposited on a square-hole microchannel plate made of lead-bismuth glass; and solid iridium acetylacetonate serves as an iridium source, metal iridium reduction is conducted with high-purity oxygen as an oxygen source, the high-purity nitrogen serves as the carrier gas and the cleaning gas, the atom layer deposition system is utilized, and the iridium film is deposited. Compared with an untreated microchannel plate, according to an aperture inner wall reflection increasing film of the square-hole microchannel plate manufactured through the method, the iridium serves as the metal reflection increasing film, and reflection efficiency is improved remarkably, so that the light intensity efficiency of the microchannel plate in the soft X-ray-extreme ultraviolet waveband imaging process can be improved effectively. By means of the method, the performance of the square-hole microchanel plate is improved, and application of the microchannel plate in a grazing incidence imaging system such as an X-ray telescope is further promoted.

Description

technical field [0001] The invention belongs to the field of optical imaging devices manufactured by micro-nano technology, and specifically relates to a method and a product for improving the soft X-ray-extreme ultraviolet imaging performance of a square hole microchannel plate as a plate by using atomic layer deposition technology. Background technique [0002] Microchannel plate (MCP) is a special optical fiber device, which is an electron multiplier with high spatial resolution and enhanced electron image function. It has the advantages of small size, light weight, high gain, good resolution, low noise and strong radiation resistance. Generally, we add an electron emission layer during the production of microchannel plate, which can multiply the energy of electrons colliding with the inner wall (channel) at high speed, so that it can increase the flow of electrons by more than 10,000 times. Taking advantage of this feature, microchannel plates are now widely used in pho...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C16/18C23C16/40C23C16/455H01J9/00H01J43/04
CPCC23C16/18C23C16/403C23C16/45525H01J9/00H01J43/04
Inventor 沈伟东方波章岳光杨陈楹袁文佳毛克宁范瑞
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap