Microscopic imaging device and method for measuring microstructure defects on surface of semiconductor material
A technology of microscopic imaging and microstructure, which is applied in the direction of measuring devices, optical testing of defects/defects, and analysis of materials, can solve the problems of complex testing process, large measurement error, and expensive testing cost, and achieve accurate test results and accurate preparation process. simple effect
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[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0032] Such as figure 1 As shown, the present invention provides a device for measuring the microscopic imaging of microstructure defects on the surface of semiconductor materials. The testing device mainly includes: a light source 10, a polarization modulation reflective differential system 20, a beam splitting prism 30, a confocal microscope system 40, a scanning platform 50, a signal acquisition system 70, and an auxiliary optical path 60 for assisting in focusing and determining Sample test location.
[0033] Wherein, the light source 10 includes a single-wavelength laser 11 and a spatial filter 12, which is a single-wavelength laser to generate laser light, which is used to provide a high-quality parallel and unifor...
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