Method of preparing hydrophobic membrane through physical vapor deposition of fluoroalkyl silane

A technology of physical vapor deposition and fluorosilane, which is applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of poor coating adhesion, high cost, poor wear resistance, etc., and achieve the utilization of raw materials The effect of high efficiency, low production cost and short process

Inactive Publication Date: 2016-07-20
XIAMEN RUNNER IND CORP
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Problems solved by technology

The disadvantage of physical vapor deposition to prepare hydrophobic coatings is that fluorosilane does not undergo chemical reactions during the deposition process, so the coating has poor adhesion, poor wear resist

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  • Method of preparing hydrophobic membrane through physical vapor deposition of fluoroalkyl silane

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[0015] The present invention is described in detail below in conjunction with specific embodiments.

[0016] A method for preparing a hydrophobic film by physical vapor deposition of fluorosilane, comprising the following steps:

[0017] One, clean the substrate.

[0018] 2. Plasma glow treatment: Put the base material into PVD vacuum equipment and vacuumize it. When the vacuum degree reaches 10 -2 At Pa, implement plasma glow treatment on the substrate, the ion source current is 0.5-0.8A, the argon flow rate is 100-200SCCM, and the time is 2-5min, so as to achieve the purpose of cleaning and activating the surface of the substrate.

[0019] 3. Intermediate frequency magnetron sputtering transparent silicon oxide film: intermediate frequency power supply 300-1000W, negative bias voltage 100-200V, argon flow rate 30-80SCCM, oxygen flow rate 50-100SCCM, sputtering time 4-7min, sputtering target The material is pure silicon target.

[0020] 4. Vacuum evaporation of fluorosilan...

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Abstract

The invention discloses a method of preparing a hydrophobic membrane through physical vapor deposition of fluoroalkyl silane. The method comprises the following steps of one, plasma glow processing: putting substrates into PVD vacuum equipment, vacuumizing, and implementing plasma glow processing on the substrates when the vacuum degree reaches 10<-2>Pa; two, medium frequency magnetron sputtering a transparent silica membrane, wherein a sputtering target material is a pure silicon target; and three, vacuum evaporation of fluoroalkyl silane hydrophobic membrane: adopting the vacuum evaporation technology, and beginning to evaporate the fluoroalkyl silane at the third minute in the process of sputtering a silicon dioxide membrane: preheating and cleaning a fluoroalkyl silane plating material for 10-30s at the voltage to be 2-3V; pre-evaporating for 20-50s at the voltage to be 3-4V; evaporating for 100-200s at the voltage to be 4-6V, depositing a layer of fluoroalkyl silane on the surface of a silicon dioxide membrane layer, and carrying out silane crosslinking reaction on the fluoroalkyl silane and silicon dioxide to obtain the transparent fluoroalkyl silane hydrophobic membrane. According to the method, a plating film with better binding force can be formed, and membrane formation does not need high-temperature braking, and the production cost is lowered.

Description

technical field [0001] The invention relates to the technical field of surface treatment, in particular to a method for preparing a hydrophobic film by physical vapor deposition of fluorosilane. Background technique [0002] The hydrophobic surface has the functions of anti-fouling, waterproof, anti-corrosion and so on. In the prior art, there are mainly two methods for preparing a hydrophobic surface: first, changing the structure and morphology of the material surface to prepare an acicular surface; second, driving the material surface to have a lower surface energy. [0003] One of the conventional preparation methods for fluorosilane hydrophobic membranes is to prepare them by dipping and then baking. The disadvantage of this method is that the process flow is longer, more fluorosilane raw materials are consumed, and the baking temperature is higher. It cannot withstand high temperature, resulting in higher cost and affecting use. [0004] The second method of conventi...

Claims

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Application Information

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IPC IPC(8): C23C14/24C23C14/12C23C14/35C23C14/10C23C14/02
CPCC23C14/24C23C14/0036C23C14/022C23C14/10C23C14/12C23C14/35
Inventor 黄贤明张先超孙昇凌李明仁
Owner XIAMEN RUNNER IND CORP
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