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Method for fixing micro-nano structure in large aspect ratio on basis of gelation

A technology of micro-nano structure and gelation, applied in micro-structure technology, micro-structure device, manufacturing micro-structure device, etc., can solve problems such as structural failure, achieve the effect of preventing failure, optimizing process parameters, and ensuring consistency

Active Publication Date: 2016-07-27
UNIV OF SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical solution of the present invention: to overcome the structural failure of the large aspect ratio micro-nano structure in the drying process in the prior art, and provide a method for fixing the large aspect ratio micro-nano structure based on gelation, by Gel is formed in the structure to eliminate the surface tension of the liquid produced by the volatilization of the solvent, thereby preventing the structure from failing, and effectively fixing the micro-nano structure formed by the process, so that the process can be carried out by detecting the quality of the micro-nano structure with a large aspect ratio. Evaluation, in order to ensure the effectiveness of the processing technology

Method used

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  • Method for fixing micro-nano structure in large aspect ratio on basis of gelation
  • Method for fixing micro-nano structure in large aspect ratio on basis of gelation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Example 1, gel immobilization of high aspect ratio micro-nanostructures for observation

[0029] 1. Prepare a hot solution of carrageenan with a mass concentration of 1%: 1g of carrageenan, 100ml of water, and heat to dissolve at 90°C;

[0030] 2. Take the 2-inch silicon wafer containing the micro-nano structure with large aspect ratio out of the developer solution and place it in deionized water. Take it out after 1 minute, and quickly add 5 ml of prepared gellan gum on the surface to heat it. solution;

[0031] 3. At room temperature, first put the silicon wafer on the gel-spinning table to cool for 30 seconds, and then spin-coat according to the set gel-spinning machine parameters: first spin-coat at 1000r / min for 10 seconds; then spin at 2000r / min Apply for 20 seconds. After the spin coating is completed, let it stand for 1 minute to obtain a fixed gel layer and form a gel-fixed micro-nano structure;

[0032] 4. Observe the silicon wafer under a microscope, and c...

Embodiment 2

[0034] Example 2, gel immobilization of large aspect ratio micro-nanostructures for electroplating

[0035] 1. Prepare gellan gum hot solution with a concentration of 0.6%: gellan gum 0.6g, water 100ml, heat to dissolve at 80°C;

[0036] 2. Take the 2-inch silicon wafer containing the micro-nano structure with large aspect ratio out of the developer solution and place it in deionized water. Take it out after 1 minute, and quickly add 5 ml of prepared gellan gum on the surface to heat it. solution;

[0037] 3. At room temperature, first put the silicon wafer on the gel-spinning table to cool for 30 seconds, and then spin-coat according to the set gel-spinning machine parameters: first spin-coat at 1000r / min for 10 seconds; then spin at 2000r / min Apply for 20 seconds. After the spin coating is completed, let it stand for 30 seconds to obtain a fixed gel layer and form a gel-fixed micro-nano structure;

[0038] 4. After placing the silicon wafer under a microscope for observat...

Embodiment 3

[0041]Example 3, gel immobilization of large aspect ratio micro-nanostructures for observation

[0042] 1. Prepare a carrageenan hot solution with a mass concentration of 0.8%: carrageenan 0.8g, water 100ml, heat to dissolve at 90°C;

[0043] 2. Take out the 2-inch silicon wafer containing the micro-nano structure with large aspect ratio from the developer solution and place it in deionized water, take it out after 1 minute, and quickly put it into the prepared hot carrageenan solution;

[0044] 3. After standing for 1 minute, pull up the silicon wafer vertically at a speed of 5mm / s, and let it stand for 5 minutes at room temperature to obtain a fixed gel layer and form a gel-fixed micro-nano structure;

[0045] 4. Observe the silicon wafer under a microscope, and conduct process evaluation by detecting the micro-nano structure;

[0046] 5. Place the observed silicon wafer in an 80°C water bath and shake gently for 2 minutes, and the gel between the micro-nano structures can ...

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Abstract

The invention relates to a method for fixing a micro-nano structure in a large aspect ratio on the basis of gelation. The method comprises steps as follows: (1) a hot-melt adhesive with the concentration being 0.1%-2.0% is prepared, the temperature of the hot-melt adhesive is 50-95 DEG C, and the gelation temperature is smaller than 40 DEG C; (2) the hot-melt adhesive is added to the micro-nano structure, the temperature is changed, a gel layer is formed, the thickness and the flatness of the gel layer are controlled with a spin coating or dip-coating process, and the micro-nano structure in the large aspect ratio is fixed in the gel layer; (3) the fixed micro-nano structure in the large aspect ratio is detected or a clamp is added; (4) a detected sample is placed in a hot water bath, and gel on the micro-nano structure is removed. Liquid surface tension produced due to solvent volatilization is eliminated by forming gel in the micro-nano structure, the structure is prevented from failing, the micro-nano structure formed with the process is effectively fixed, accordingly, process evaluation can be performed by detecting the micro-nano structure in the large aspect ratio, and the effectiveness of a processing process is guaranteed.

Description

technical field [0001] The invention relates to a method for fixing a micro-nano structure with a large aspect ratio based on gelation, which belongs to micro-nano processing and application. Background technique [0002] Large aspect ratio generally means that the aspect ratio is greater than 5 micronano structures have many important applications, such as optical components for short-wave optics, inertial devices for acceleration measurement, and electronic devices for high-frequency communications. Widely used in aerospace and other fields. The performance of these components is closely related to the aspect ratio of their micro-nano structures. Like the optical component zone plate used for X-ray microscopic imaging, in order to obtain excellent optical properties such as high resolution and high diffraction efficiency, the wave Ribbon sheets have nanostructures with large aspect ratios. Generally, the larger the aspect ratio of the micro-nano structures contained in t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B81C99/00
CPCB81C1/00658B81C99/004
Inventor 刘刚陈楠熊瑛张晓波田扬超陆亚林
Owner UNIV OF SCI & TECH OF CHINA
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