Method for synthesizing carbon nano tube flower through chemical vapor deposition
A chemical vapor deposition, carbon synthesis technology, applied in the chemical industry, nanotechnology, climate sustainability, etc., can solve the problems of poor mechanical properties and chemical stability, high energy consumption, poor wear resistance, etc. The effect of low requirements, low energy consumption and convenient operation
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Embodiment 1
[0023] 1) Use titanium foil (such as figure 1 (a) is the substrate, and the substrate is pretreated, specifically: ultrasonic cleaning with acetone, ethanol and water for 10 minutes respectively → chemical degreasing → clean water cleaning → etching → clean water cleaning → drying; where:
[0024] In the chemical degreasing operation: the composition of the chemical degreasing liquid is: sodium hydroxide 15g / L, sodium carbonate 25g / L, OP emulsifier 5mL / L and the remainder of water; the substrate after ultrasonic cleaning is placed at 60℃ Remove oil from the oil removal liquid for 15 minutes;
[0025] During the etching operation: the composition of the etching solution is calculated by volume percentage: 30% hydrochloric acid, 5% hydrofluoric acid and the balance of water; the substrate after degreasing treatment is etched in the etching solution for 2 minutes, Clean with clean water;
[0026] 2) Put the pretreated substrate in a nickel plating solution for chemical deposition for 8...
Embodiment 2
[0032] 1) Using titanium foil as the substrate, the substrate is pretreated, specifically: ultrasonic cleaning with acetone, ethanol and water for 10 minutes respectively → chemical degreasing → clean water cleaning → etching → clean water cleaning → drying; among them:
[0033] In the chemical degreasing operation: the composition of the chemical degreasing liquid is: sodium hydroxide 10g / L, sodium carbonate 30g / L, OP emulsifier 3mL / L and the remainder of water; the substrate after ultrasonic cleaning is placed at 50℃ Remove oil from the oil removal liquid for 10 minutes;
[0034] During the etching operation: the composition of the etching solution is calculated by volume percentage: 20% hydrochloric acid, 3% hydrofluoric acid and the balance of water; the substrate after the degreasing treatment is etched in the etching solution for 2 minutes. Clean with clean water;
[0035] 2) Put the pretreated substrate in a nickel plating solution for chemical deposition for 10 minutes, and ...
Embodiment 3
[0038] 1) Using copper foil as the substrate, the substrate is pretreated, specifically: ultrasonic cleaning with acetone, ethanol and water respectively for 10 minutes→chemical degreasing→cleaning with clean water→etching→cleaning with clean water→drying; where:
[0039] In the chemical degreasing operation: the composition of the chemical degreasing liquid is: sodium hydroxide 12g / L, sodium carbonate 20g / L, OP emulsifier 2mL / L and the remainder of water; the substrate after ultrasonic cleaning is placed at 50℃ Remove oil from the oil removal liquid for 10 minutes;
[0040] During the etching operation: the composition of the etching solution is calculated by volume percentage: 25% hydrochloric acid, 2% hydrofluoric acid and the balance of water; the substrate after degreasing treatment is etched in the etching solution for 1 min. Clean with clean water;
[0041] 2) Put the pretreated substrate in a nickel plating solution for chemical chemical deposition for 5 minutes, and then pl...
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