Method for preparing photonic crystal with inverse opal structure through ultraviolet radiation

A technology of inverse opal structure and photonic crystal, which is applied in the field of preparing inverse opal structure photonic crystal by ultraviolet irradiation, can solve problems such as inapplicability of inverse opal structure photonic crystal, and achieves a wide range of substrate material selection, low cost and simple preparation method. Effect

Inactive Publication Date: 2017-02-08
ZHEJIANG SCI-TECH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these methods are not suitable for obtaining inverse opal-structured photonic crystals on subst

Method used

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  • Method for preparing photonic crystal with inverse opal structure through ultraviolet radiation
  • Method for preparing photonic crystal with inverse opal structure through ultraviolet radiation
  • Method for preparing photonic crystal with inverse opal structure through ultraviolet radiation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] (1) Mix 1 part (in terms of solid content) of monodisperse PMMA colloidal microspheres with a particle size of 250nm (dispersion coefficients are less than 0.08) with 100 parts of deionized water, and ultrasonically disperse for 15 minutes to form a uniform dispersion of PMMA colloidal microspheres liquid.

[0033] (2) PMMA colloidal microsphere dispersion liquid is placed in the plastic Petri dish that is placed the polyester plain weave fabric, makes it immerse fabric surface, at 60 ℃, in the constant temperature and humidity chamber of 50% relative humidity, carry out vertical deposition self-assembly, wait for After the solvent evaporated for 36 h, the ordered PMMA opal structure photonic crystal template was deposited and formed.

[0034] (3) Use 10% SiO with a particle size of 15nm 2 The colloidal microspheres were dropped onto the PMMA opal structure photonic crystal template for infiltration, and dried at room temperature.

[0035] (4) The initial PMMA opal st...

Embodiment 2

[0037] (1) Mix 10 parts (in terms of solid content) of monodisperse PMMA colloidal microspheres (dispersion coefficient less than 0.08) with a particle size of 315nm and 100 parts of deionized water, and ultrasonically disperse for 15 minutes to form a uniform dispersion of PMMA colloidal microspheres .

[0038] (2) The PMMA colloidal microsphere dispersion is placed in a plastic petri dish with a polyester plain weave fabric, so that it is immersed in the surface of the fabric, and vertical deposition self-assembly is carried out in a constant temperature and humidity chamber at 45 ° C and a relative humidity of 60%. After the solvent was evaporated for 72 hours, an ordered PMMA opal structure photonic crystal template was deposited and formed.

[0039] (3) Use 20% SiO with a particle size of 60nm 2 The colloidal microspheres were dropped onto the PMMA opal structure photonic crystal template for infiltration, and dried at room temperature.

[0040] (4) The initial PMMA opa...

Embodiment 3

[0042] (1) Mix 1 part (in terms of solid content) of monodisperse PMMA colloidal microspheres (dispersion coefficient less than 0.08) with a particle size of 500nm and 100 parts of deionized water, and ultrasonically disperse for 15 minutes to form a uniform dispersion of PMMA colloidal microspheres .

[0043] (2) The PMMA colloidal microsphere dispersion was placed in a plastic petri dish with a polyester plain weave fabric to immerse the surface of the fabric, and vertical deposition self-assembly was carried out in a constant temperature and humidity chamber at 50°C and a relative humidity of 40%. After the solvent was evaporated for 48 hours, an ordered PMMA opal structure photonic crystal template was deposited and formed.

[0044](3) Use 5% SiO with a particle size of 30nm 2 The colloidal microspheres were dropped onto the PMMA opal structure photonic crystal template for infiltration, and dried at room temperature.

[0045] (4) The initial PMMA opal structure photonic...

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Abstract

The invention discloses a method for preparing photonic crystal with an inverse opal structure through ultraviolet radiation. The method comprises: mixing mono-dispersed colloid microspheres with deionized water, and performing ultrasonic dispersion to form a uniform colloid microsphere dispersion liquid; pre-arranging a substrate in a plastic colorimetric ware, soaking the surface of the substrate with the colloid microsphere dispersion liquid for vertical deposition self-assembly, and obtaining a template of the photonic crystal with an opal structure; adding a refractive index material or a precursor material thereof, such as silica, zinc sulfide, zinc oxide, silver sulfide, titanium dioxide, antimony trisulfide, and alumina dropwise on the template, carrying out natural penetration, and performing drying at the room temperature; and removing the initial template of the photonic crystal with an opal structure in an ultraviolet radiation manner to obtain the photonic crystal with an inverse opal structure on the substrate. The method is simple and is low in cost and wide in material selection range.

Description

technical field [0001] The invention belongs to the field of preparation of new materials, and in particular relates to a method for preparing photonic crystals with an inverse opal structure by ultraviolet irradiation. Background technique [0002] A photonic crystal is an artificial "crystal" structure formed by arranging two or more dielectric materials with different dielectric constants (refractive indices) in space at a certain period (the size is on the order of the wavelength of light). It is characterized by a photonic bandgap that enables light to propagate and disperse. When light of a specific frequency irradiates a photonic crystal, Bragg diffraction will occur on the interface, resulting in many new physical phenomena, such as structural color phenomenon, super prism phenomenon and negative refractive index medium effect, etc., which has attracted great attention of researchers. . As an important class of advanced optical materials, photonic crystals have sho...

Claims

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Application Information

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IPC IPC(8): C30B29/16C30B29/48C30B29/46C30B30/00C30B5/00B82Y40/00B82Y30/00
CPCC30B5/00C30B29/16C30B29/46C30B29/48C30B30/00B82Y30/00B82Y40/00
Inventor 周岚邵建中丁姣刘国金张国庆柴丽琴李义臣
Owner ZHEJIANG SCI-TECH UNIV
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