Method for preparing perovskite solar cell mesoporous layer by means of anodic oxidation etching
A solar cell, anodizing technology, applied in surface reaction electrolytic coatings, coatings, circuits, etc., can solve the problems of complex preparation methods, disordered structures unfavorable to photogenerated electronic interfaces, etc., and achieve simple methods, electron separation and transmission performance. Good and efficient effect
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Embodiment 1
[0058] The feeding ratio is argon, the total pressure is controlled to 1Pa, the distance between the target and the substrate is 8cm, the initial chamber temperature is kept at room temperature, and the DC power supply (electric power is 400W) is turned on, the pure titanium target is sputtered, and the deposition The time is 20 minutes. Before sputtering the titanium film, the sample has deposited a dense layer of titanium dioxide on the FTO substrate. The specific method includes: using titanium as the target material, argon as the sputtering gas, oxygen as the reaction gas, and the total pressure can be 1.5Pa . The target-to-substrate distance can be 8 cm. The power of the DC power supply applied to the target may be 700W. The deposition temperature may be below 80°C. The deposition time may be 15 minutes. The background vacuum is lower than 10 -4 Pa. Then take out the sample deposited with a layer of uniform titanium metal film, blow the dust on the surface by compre...
Embodiment 2
[0061] The feeding ratio is argon, the total pressure is controlled to 1Pa, the distance between the target and the substrate is 8cm, the initial chamber temperature is kept at room temperature, and the DC power supply (electric power is 400W) is turned on, the pure titanium target is sputtered, and the deposition The time is 20 minutes. Wherein, before sputtering the titanium film, the sample had deposited a dense layer of titanium dioxide on the FTO substrate (see Example 1 for the preparation method). Then take out the sample deposited with a layer of uniform titanium metal film, blow the dust on the surface by compressed air, and carry out anodic oxidation treatment. Wherein the voltage is 20 volts, the time is 60 minutes, the electrolyte is composed of ethylene glycol, polyethylene glycol, water and 30% ammonium fluoride solution, and its proportioning ratio is 100:30:1:0.5;
[0062] Annealing the processed sample takes 1 hour at every 100°C temperature rise, and keeps i...
Embodiment 3
[0064] The feeding ratio is argon, the total pressure is controlled to 1Pa, the distance between the target and the substrate is 8cm, the initial chamber temperature is kept at room temperature, and the DC power supply (electric power is 400W) is turned on, the pure titanium target is sputtered, and the deposition The time is 20 minutes. Wherein, before sputtering the titanium film, the sample had deposited a dense layer of titanium dioxide on the FTO substrate (see Example 1 for the preparation method). Then take out the sample deposited with a layer of uniform titanium metal film, blow the dust on the surface by compressed air, and carry out anodic oxidation treatment. Wherein the voltage is 25 volts, the time is 60 minutes, the electrolyte is composed of ethylene glycol, polyethylene glycol, water and 30% ammonium fluoride solution, and its proportioning ratio is 100:30:1:0.5;
[0065] Annealing the processed sample takes 1 hour at every 100°C temperature rise, and keeps i...
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