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Preparation method of layered high purity zircon refractory material

A technology of refractory materials and zircon, which is applied in the field of preparation of layered high-purity zircon refractory materials, can solve the problems of glass transmittance and light absorption, and it is difficult to meet the low impurity content of high-grade optical glass and laser glass. Ease of design and application, high quality and low, good resistance to erosion effects

Active Publication Date: 2017-03-22
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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AI Technical Summary

Problems solved by technology

[0003] For high-grade optical glass to meet the imaging quality and high transmittance, the absorption coefficient at a specific wavelength is required to be small, especially for laser glass to meet the high gain and high energy density indicators, the smaller the light absorption coefficient at the laser wavelength, the better Well, using common commercial refractories due to Fe 2 o 3 The impurity content of transition metals and other transition metals is generally on the order of thousands of ppmw. After the glass is eroded, these impurities will enter the glass melt, which is difficult to meet the requirements of high-grade optical glass, especially laser glass. The transmittance and light absorption of the glass and other indicators have a fatal impact

Method used

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  • Preparation method of layered high purity zircon refractory material
  • Preparation method of layered high purity zircon refractory material
  • Preparation method of layered high purity zircon refractory material

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preparation example Construction

[0030] The preparation method of the layered high-purity zircon refractory material of the present invention comprises the following steps:

[0031] ① Preparation of high-purity zircon raw materials: ZrO with purity ≥ 99.9%, 66-67.7wt% is selected 2 , SiO with purity ≥99.9%, 32-33wt% 2 , purity ≥ 99.5%, 0.3 ~ 2wt% TiO 2 , mixed with zirconia ball milling until the fineness is 0.1~5μm≥95%, and then synthesized by calcination at ≥1100°C for 20~48 hours, adding 0.1~0.2wt% of high-grade pure phosphoric acid, using zirconia The balls are ground into mud, and the fineness requirement is 0.1-6 μm ≥ 95%. The mud-like high-purity zircon is dried, the powder is pulverized, and passed through a 30-mesh vibrating sieve to obtain a high-purity zircon raw material;

[0032] ②Preparation of ordinary zircon raw materials: choose ZrSiO 4 ≥98.5% common zircon raw material, plus 0.3~2wt% TiO 2 , 0.1-0.2wt% phosphoric acid, using zirconia balls to grind into slurry, with a fineness of 0.1-6μm...

Embodiment 1

[0043] According to the size of the refractory material, estimate the raw material consumption of high-purity zircon and common commercial zircon. High-purity zircon raw materials need to be artificially synthesized.

[0044] 125 kg of high-purity zircon raw materials are required, and a balance of 30wt% needs to be reserved for production and subsequent processing, according to the following ratio: high-purity ZrO 2 66.2wt%, high-purity SiO 2 33wt%, 0.8wt% high-purity TiO 2 , equipped with 162 kg of raw materials. All raw material purity ≥99.9%, and CuO content ≤5ppmw, CuO+Co 2 o 3 +NiO+Cr 2 o 3 ≤10ppmw, Fe 2 o 3 Content ≤ 50ppmw. Ball mill the zirconia and silica mixture for 36 hours until the fineness requirement is 0.1~6μm≥95%1μm, put it into a clean mold, calcinate at 1350℃ for 30 hours, and then generate high-purity zircon raw material by solid state reaction. use.

[0045] 54 kg of ordinary commercial zircon raw materials are required, and 30 wt% of productio...

Embodiment 2

[0049] According to the size of the refractory material, estimate the raw material consumption of high-purity zircon and common commercial zircon. High-purity zircon raw materials need to be artificially synthesized.

[0050] 53.5 kg of high-purity zircon raw materials are required, and a balance of 30wt% needs to be reserved for production and subsequent processing, according to the following ratio: high-purity ZrO 2 66wt%, high purity SiO 2 32wt%, 2wt% high purity TiO 2 , configure 70 kg of raw materials. All raw material purity ≥99.9%, and CuO content ≤5ppmw, CuO+Co 2 o 3 +NiO+Cr 2 o 3 ≤10ppmw, Fe 2 o 3 Content ≤ 50ppmw. Ball mill the zirconia and silica mixture for 36 hours until the fineness requirement is 0.1~6μm≥95%1μm, put it into a clean mold, calcinate at 1100°C for 20 hours, and then generate high-purity zircon raw material by solid state reaction. use.

[0051] 53.5 kg of common commercial zircon raw materials are required, and 30wt% production and proce...

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Abstract

The invention relates to a preparation method of a layered high purity zircon refractory material. The method includes the steps of: preparation of a high-purity zircon raw material, preparation of a common zircon raw material, layered isostatic pressing and high temperature solid phase sintering. Experiments show that very little transition metal impurity ion contamination is introduced in a glass smelting process of the layered high purity zircon refractory material prepared by the method provided by the invention, a layered molding technology can be employed to control the cost, and also can achieve good anti-glass corrosion effect.

Description

technical field [0001] The invention relates to a high-purity refractory material, in particular to a method for preparing a layered high-purity zircon refractory material. The refractory material is used as a material for high-grade optical glass melting furnaces, laser glass melting furnaces and metal smelting furnaces. Background technique [0002] Refractory materials are indispensable basic materials for high-temperature technology. All industrial production processes involving high-temperature chemical reactions must have refractory materials that are resistant to high temperature and corrosion, and in many cases can resist stress or rapid temperature changes. China is the world's largest producer and consumer of refractory materials. At the same time, China's active role in the field of refractory research and development has become increasingly apparent. With worldwide attention to low-carbon economy and environmental protection, as well as difficulties in the effec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B35/66C04B35/16C04B35/64
CPCC04B35/16C04B35/64C04B35/66C04B2235/3232C04B2235/3244C04B2235/5436C04B2235/5445C04B2235/6562C04B2235/75
Inventor 胡丽丽唐景平蒋亚丝邹兆松钱敏肖子良
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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