Branched alkyl substituted silanized aromatic hydrocarbon self-assembled lubricating film and preparation method thereof
A technology for silanizing aromatic hydrocarbons and branched alkyl groups, which is used in lubricating compositions, base materials, petroleum industry, etc., can solve problems such as limited binding force, and achieve the effects of reducing adhesion work, improving strength, and good adhesion.
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Embodiment 1
[0019] (1) Sonicate a square monocrystalline silicon with a side length of 5mm in acetone, water, and ethanol for 10 minutes respectively, and then put it into 5 mL of hydrofluoric acid solution with a mass fraction of 5% for 5 minutes, wash it with water first, and then wash it with ethanol Ultrasonic cleaning for 5 minutes, then immersing in a mixed solution of sulfuric acid and hydrogen peroxide and boiling until no bubbles are generated, first cleaning with water, then cleaning with ethanol, dehydrating and drying, forming free hydroxyl groups on the surface of single crystal silicon, and obtaining hydroxylated monocrystalline silicon. Crystalline silicon;
[0020] (2) Put the hydroxylated single crystal silicon in a hydrothermal reaction kettle, then add 10mL of absolute ethanol and 2mL of phenyltrimethoxysilane, then react at 80°C for 12h, and ultrasonically clean with ethanol. self-assembly on the surface to form a phenylsilane layer;
[0021] (3) Add the monocrystalli...
Embodiment 2
[0024] (1) Sonicate a square monocrystalline silicon with a side length of 5 mm in acetone, water, and ethanol for 30 min, respectively, and then put it into 5 mL of hydrofluoric acid solution with a mass fraction of 35% to react for 0.1 min, wash it with water, and then use Ultrasonic cleaning with ethanol for 5 minutes, then immersing in a mixed solution of sulfuric acid and hydrogen peroxide and boiling until no bubbles are generated, first cleaning with water, then cleaning with ethanol, dehydrating and drying, forming free hydroxyl groups on the surface of single crystal silicon, that is, hydroxylated monocrystalline silicon;
[0025] (2) Put the hydroxylated single crystal silicon in a hydrothermal reaction kettle, add anhydrous 10mL ethanol and 1mL phenyltrimethoxysilane, then react at 40°C for 48h, and ultrasonically clean with ethanol. self-assembly on the surface to form a phenylsilane layer;
[0026] (3) Add the monocrystalline silicon with the surface self-assembl...
Embodiment 3
[0029] (1) Sonicate a square monocrystalline silicon with a side length of 5 mm in acetone, water, and ethanol for 20 minutes, and then put it into 5 mL of hydrofluoric acid solution with a mass fraction of 1% to react for 30 minutes. Ultrasonic cleaning for 5 minutes, then immersing in a mixed solution of sulfuric acid and hydrogen peroxide and boiling until no bubbles are generated, first cleaning with water, then cleaning with ethanol, dehydrating and drying, forming free hydroxyl groups on the surface of single crystal silicon, and obtaining hydroxylated monocrystalline silicon. Crystalline silicon;
[0030] (2) Put the hydroxylated single crystal silicon in a hydrothermal reaction kettle, add 10mL of ethanol and 0.5mL of phenyltrimethoxysilane, then react at 80°C for 48h, and use ethanol to ultrasonically clean the surface of the single crystal silicon self-assembled to form a phenylsilane layer;
[0031] (3) Add the monocrystalline silicon with the surface self-assemble...
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