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Preparation method for hollow Janus particles

A hollow, granular technology, applied in the direction of vacuum evaporation plating, manufacturing microstructure devices, and the process for producing decorative surface effects, etc., can solve the problems of complex preparation process, small particle size, poor dispersion, etc., and achieve fast and simple preparation , good fluidity and low surface energy

Inactive Publication Date: 2018-01-12
XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the preparation of hollow Janus microspheres is mostly chemical etching method, the preparation process is complicated, the structure is mostly core-shell structure and the pressure bearing capacity is poor. In addition, the particle size is small (mostly submicron or nanoscale) and dispersed. Poor performance, not conducive to its application research

Method used

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  • Preparation method for hollow Janus particles
  • Preparation method for hollow Janus particles
  • Preparation method for hollow Janus particles

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] First, take 10 g of hollow glass microspheres with a nominal diameter distribution of φ15-40 μm (H60, Sinosteel Maanshan Mining Institute New Material Technology Co., Ltd.), and place them in 1 L of dilute sodium hydroxide solution with a concentration of 4% by mass. Soak for 40 minutes, then repeatedly wash with deionized water, then perform ultrasonic and centrifugal separation, and prepare a dilute solution of hollow glass microbeads (mass percentage: 1-5%). A 4-inch silicon wafer was placed in a plasma sputtering apparatus (EDT-2000), and oxygen was introduced to carry out surface hydrophilic modification to obtain a super-hydrophilic silicon wafer. Take 10ml of the dilute solution of hollow glass microspheres above and evenly drop it on the silicon wafer, put the silicon wafer on the glue homogenizer, and put it under different graded rotation speeds (class I revolution number 500r / min, 10s; class II revolution number 3000r / min, 15s) ) to spread the hollow glass mi...

Embodiment 2

[0032] The self-driving performance of the hollow Pt-Janus particles prepared in Example 1 was verified. Take an appropriate amount of hollow Pt-Janus particles and 3% H 2 o 2 The solutions were mixed to obtain a Pt-Janus particle solution. Take 40 μL of the mixed solution on a glass slide, and observe it under a Nikon inverted microscope, use a high-speed CCD to record the hollow Pt-Janus particles in dilute H 2 o 2 Self-driven trajectories in solution, such as image 3 Shown are hollow Pt-Janus particles in 3% H 2 o 2 The 1.5s trajectory in the solution. Since the hollow Pt-Janus particles are on the order of 20 microns, the driving mode is bubble-driven, and the range of motion trajectory is much larger than that of small-sized Pt-Janus particles at the same concentration of H. 2 o 2 The self-diffusion driving range in . The driving type and driving trajectory obtained in Example 2 verified the successful preparation of large-sized hollow Janus particles.

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Abstract

The invention discloses a method for preparing hollow Janus particles in different particle diameter ranges. The method comprises the following steps of taking hollow glass beads as carriers and carrying out simple preprocessing on surfaces of the hollow glass beads to obtain hollow glass bead solution; carrying out spin coating on the hollow glass bead solution on a single-side polished silicon wafer under different spin speeds through utilization of a spin coating technology; after the spin coated silicon wafer is dried, carrying out rapid preparation of the hollow Janus particles of different types and different particle diameters through utilization of an electron beam evaporation coating technology or magnetron sputtering coating technology. The preparation method provided by the invention is rapid, is high in stability and is not influenced by other interference factors. The particle diameter application ranges of the prepared hollow Janus particles are wide, the dispersity of the particles is high, and the particles are beneficial for carrying out direct application research.

Description

technical field [0001] The invention belongs to the technical field of Janus particle preparation, and in particular relates to a method for preparing hollow Janus particles. Background technique [0002] Janus particles are a general term for heterogeneous particles with different properties on both sides. It was proposed by P.G. de Gennes in 1991 and has subsequently received widespread attention. Utilizing the asymmetric structure of Janus particles, a huge gradient of physical fields such as concentration, temperature or light intensity is formed on the particle surface by asymmetric physical and chemical reactions. For micro-nano-scale Janus particles, the asymmetric momentum distribution caused by the above gradient can be used This problem has important applications in the fields of micro-electromechanical systems, microbial tropism, low-Re number hydrodynamics, environmental monitoring and repair, etc. to make particles move autonomously. The size and density of Jan...

Claims

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Application Information

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IPC IPC(8): B81C1/00C23C14/16C23C14/08
Inventor 王雷磊崔海航张静陈力王磊
Owner XI'AN UNIVERSITY OF ARCHITECTURE AND TECHNOLOGY
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