Micro hotplate of silica-based structure and preparation method thereof

A micro-hot plate, silicon-based technology, applied in micro-structure technology, micro-structure devices, manufacturing micro-structure devices, etc. Expansion and shrinkage problems, to achieve the effect of low cost, increased thickness, and reduced power consumption

Pending Publication Date: 2018-08-24
NANJING UNIV OF POSTS & TELECOMM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the direct heating type heating layer has the following disadvantages: firstly, there is an influence between the signal circuit and the heating circuit; secondly, the expansion and contraction of the device after heating may easily cause poor contact
[0007] CN 203998937U discloses a MEMS silicon-based micro-hot plate. On the basis of t

Method used

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  • Micro hotplate of silica-based structure and preparation method thereof
  • Micro hotplate of silica-based structure and preparation method thereof
  • Micro hotplate of silica-based structure and preparation method thereof

Examples

Experimental program
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Embodiment 1

[0044] A silicon-based microhotplate, such as figure 1 shown. The substrate selects single crystal silicon with crystal orientation, such as Figure 5 As shown; firstly, porous silicon 2 is formed on a single crystal silicon substrate using an anodic oxidation method, such as Image 6 shown; then part of the porous silicon 2 is oxidized to form silicon dioxide 3, which is attached to the surface of the porous silicon 2, such as Figure 7 Shown; Spin glue on the surface of silicon dioxide 3, make positive photoresist 6 evenly distributed on silicon dioxide 3, as Figure 8 As shown, in order to increase the adhesiveness between the positive photoresist 6 and the silicon dioxide 3, it is dried immediately after spinning the resist.

[0045] according to figure 2 According to the shape of the electrode, the corresponding mask plate 7 is engraved, so that only the position of the sputtering electrode is exposed on the silicon wafer, and the other parts are protected with phot...

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PUM

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Abstract

The invention discloses a micro hotplate of a silicon-based structure and a preparation method thereof, a substrate of the micro hotplate is a monocrystalline silicon of which crystal orientation is (100), a surface of the substrate is orderly coated with a porous silicon layer, a thermal isolation layer and a heating area from inside to outside, the thermal isolation layer is a silicon dioxide layer, and the heating area is a Pt electrode, wherein the back of the substrate and the porous silicon layer are corroded into a pit. For the micro hotplate provided by the invention, on the basis of original corrosion, the porous silicon layer in the middle is further corroded. A contact area of the corroded thermal isolation layer with the air is increased, since the air has poor heat conductingproperty, heat of a work area can be effectively prevented from losing to a silicon base; the newly designed indirectly heated Pt electrode can concentrate heat effectively in the work area, and thus,working efficiency is improved. The preparation method is low-cost, steady in processing technology and easy for batch production.

Description

technical field [0001] The invention belongs to the field of semiconductor sensors, and in particular relates to a silicon-based micro-hot plate and a preparation method thereof. Background technique [0002] While the rapid development of industry has brought considerable benefits, it has also caused pollution to the environment. Harmful and toxic gases emitted by factories are always endangering the ecological environment and human health. In personal homes, flammable and explosive gases also pose a threat. The gas sensor is an electronic nose that can detect toxic and harmful gases in the air and convert the detected gas composition and concentration into electrical signals. Widely used in chemical industry, environmental detection, disaster prevention and alarm, etc. [0003] In recent years, microelectromechanical systems (MEMS) technology has been vigorously developed. The application of MEMS technology on sensors is a research hotspot at home and abroad. Compared...

Claims

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Application Information

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IPC IPC(8): B81B7/02B81C1/00
CPCB81C1/00015B81B7/02B81C1/00B81C1/00261
Inventor 李卫刘菊燕丁超王琳琳蔡云潘沛峰
Owner NANJING UNIV OF POSTS & TELECOMM
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